Thin Solid Films

Thin Solid Films, Vol.263, No.1 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (19 articles)

1 - 12	Directional and Preferential Sputtering-Based Physical Vapor-Deposition Rossnagel SM
13 - 15	Effect of Gas Environment on 2nd-Harmonic Generation of Langmuir-Blodgett-Films Zhao XS, Xie XM, Xia XH, Wang KZ, Huang CH, Li TK, Xu LG
16 - 17	A Current Measurement Technique Applied to Langmuir Films Hasmonay H, Hochapfel A, Dumas G, Peretti P
18 - 27	Ellipsometric Investigations During Titanium Deposition in a Hollow-Cathode Are Evaporation Device Steffen H, Wulff H
28 - 36	Chemical-Vapor-Deposition of Al2O3 on Tio Fredriksson E, Carlsson JO
37 - 41	Sb-Doped SnO2 Transparent Conducting Oxide from the Sol-Gel Dip-Coating Technique Terrier C, Chatelon JP, Berjoan R, Roger JA
42 - 46	Oblique Growth of Iron Thin-Films on Glass - A Cross-Sectional Transmission Electron-Microscopy Study Frechard P, Andrieu S, Chateigner D, Hallouis M, Germi P, Pernet M
47 - 53	Fabrication of Titanium-Oxide Thin-Films by Controlled Growth with Sequential Surface Chemical-Reactions Kumagai H, Matsumoto M, Toyoda K, Obara M, Suzuki M
54 - 64	Initial-Stages of Growth During CVD of W on TiSi2 Substrates Engqvist J, Jansson U
65 - 71	Gas-Phase Kinetics for TiO2 CVD - Hot-Wall Reactor Results Zhang QM, Griffin GL
72 - 78	The Growth of Thin Cu Films on an O-Precovered Ru(0001) Surface Studied by Low-Energy Ion-Beams Shen YG, Oconnor DJ, Vanzee H, Wandelt K, Macdonald RJ
79 - 84	Deposition of Manganese-Doped Zinc-Sulfide Thin-Films by the Successive Ionic Layer Adsorption and Reaction (Silar) Method Lindroos S, Kanniainen T, Leskela M, Rauhala E
85 - 91	Alternating Sputtered Al-Mo Deposits and Their Interaction with a Au Top Layer Lin KL, Ho YJ, Ho JK
92 - 98	The Optical Band-Gap of Semiconducting Iron Disilicide Thin-Films Ozvold M, Bohac V, Gasparik V, Leggieri G, Luby S, Luches A, Majkova E, Mrafko P
99 - 104	Picosecond Decay of Photoinduced Absorption in Undoped Amorphous and Polycrystalline Silicon Thin-Films Kubinyi M, Grofcsik A, Jones WJ, Dyer TE, Marshall JM, Hepburn AR
105 - 110	Preparation and Properties of Transparent Conducting Indium Tin Oxide-Films Deposited by Reactive Evaporation Ma HL, Zhang DH, Ma P, Win SZ, Li SY
111 - 116	Microstructure and Magnetoresistance in Cu-Co Alloy Thin-Films Yamamoto K, Kitada M
117 - 121	Cyclic Alkylsilanes as Low-Pressure Chemical-Vapor-Deposition Silicon Dioxide Precursors Laxman RK, Hochberg AK, Cheng HS, Roberts DA
122 - 126	Relations Between Structural and Electronic-Properties of SnO2 Polycrystalline Thin-Films Prepared by the Aerosol MOCVD Technique Ivashchenco AI, Karyaev EV, Khoroshun IV, Kiosse GA, Moshnyaga VT, Petrenco PA