1 - 14 |
Growth and characterization of Pb( Zr,Ti)O-3 thin films and ferroelectric polarization charging of YBa2Cu3O7 thin films Aidam R, Schneider R |
15 - 22 |
On the nature of the origin of the isothermal and non-isothermal current released from dielectric materials Neagu ER, Neagu RF |
23 - 32 |
XPS analysis of new lithium cobalt oxide thin-films before and after lithium deintercalation Dupin JC, Gonbeau D, Benqlilou-Moudden H, Vinatier P, Levasseur A |
33 - 36 |
Low dielectric constant plasma polymerized methyl-cyclohexane thin films deposited by inductively coupled plasma-enhanced chemical vapor deposition Jo H, Quan YC, Jung D |
37 - 45 |
Determination of the thickness of thin silane films on aluminium surfaces by means of spectroscopic ellipsometry Franquet A, De Laet J, Schram T, Terryn H, Subramanian V, van Ooij WJ, Vereecken J |
46 - 52 |
Effect of sputtering-gas pressure on properties of silicon nitride films produced by helicon plasma sputtering Li WT, McKenzie DR, McFall WD, Zhang QC |
53 - 57 |
Pattern evolution during the growth of CrSi2 layers on Si (111) upon high current pulsed Cr ion implantation Zhu HN, Liu BX |
58 - 64 |
Spectroscopic ellipsometry investigation of V2O5 nanocrystalline thin films Losurdo M, Barreca D, Bruno G, Tondello E |
65 - 68 |
Deep-level transient spectroscopy (DLTS) of CdS/CuIn(1)Ga(x)Se(2-)based solar cells prepared from electroplated and auto-plated precursors, and by physical vapor deposition Bhattacharya RN, Balcioglu A, Ramanathan K |
69 - 75 |
Influence of oxygen on the morphological and structural properties of Ti thin films grown by ion beam-assisted deposition Lopez JM, Gordillo-Vaquez FJ, Fernandez M, Albella JM |
76 - 84 |
Fluorescent apparent quantum yields for excited molecules near dielectric interfaces Shu QQ, Hansma PK |
85 - 89 |
Energy based approach to the failure of brittle coatings on metallic substrates van der Varst PGT, de With G |
90 - 101 |
Atomic force microscopy observation of the morphology of tetracyanoquinodimethane (TCNQ) deposited from solution onto the atomically smooth native oxide surface of Al(111) films Higo M, Lu X, Mazur U, Hipps KW |
102 - 108 |
Influence of substrate bias voltage on the in situ stress measured by an improved optical cantilever technique of sputtered chromium films Gautier C, Moulard G, Chatelon JP, Motyl G |
109 - 114 |
Alternate heteroepitaxial growth of chloroindium phthalocyanine and chloroaluminum phthalocyanine ultrathin multilayered structure and its xerographic and optical properties Xu MS, Xu JB, Tian DX, Ji ZG, Chen HZ, Wang M, Que DL |
115 - 119 |
Application of optical method for quantitative investigation of MgO erosion in a.c. plasma display panels Choi S, Oh SG, Lee S |
120 - 124 |
IR studies on J-aggregates in Langmuir-Blodgett films of mutually mixed merocyanine dyes Lan MB, Ikegami K |
125 - 131 |
Lamellar Langmuir-Blodgett films of hydrophobized colloidal gold nanoparticles by organization at the air-water interface Sastry M, Gole A, Patil V |
132 - 137 |
Effects of annealing on the crystallization and roughness of PLZT thin films Simoes AZ, Gonzalez AHM, Zaghete MA, Varela JA, Stojanovic BD |
138 - 145 |
Large grain electroluminescent ZnS : Mn thin films grown by quasi-rheotaxy on insulating materials Romeo N, Fermi F, Tedeschi R, Bosio A, Canevari V, Cozzi S |
146 - 150 |
Ferroelectric YMnO3 thin films grown by metal-organic chemical vapor deposition for metal/ferroelectric/semiconductor field-effect transistors Choi KJ, Shin WC, Yoon SG |
151 - 156 |
Thickness dependent electrical resistivity of ultrathin (< 40 nm) Cu films Liu HD, Zhao YP, Ramanath G, Murarka SP, Wang GC |