1 - 6 |
Deposition and annealing effect on lanthanum sulfide thin films by spray pyrolysis Bagde GD, Sartale SD, Lokhande CD |
7 - 13 |
High dielectric constant in CaCu3Ti4O12 thin film prepared by pulsed laser deposition Zhao YL, Pan GW, Ren QB, Cao YG, Feng LX, Jiao ZK |
14 - 19 |
The effect of deposition parameters on the properties of yttria-stabilized zirconia thin films Ruddell DE, Stoner BR, Thompson JY |
20 - 25 |
Densification of In2O3: Sn multilayered films elaborated by the dip-coating sol-gel route Daoudi K, Canut B, Blanchin MG, Sandu CS, Teodorescu VS, Roger JA |
26 - 31 |
Conformational polymorphs in vacuum evaporated thin film of 5,5'''-bis[(2,2,5,5-tetramethyl-1-aza-2,5-disila-1-cyclopentyl)ethyl]-2,2': 5',2'': 5'',2'''-quaterthiophene Muguruma H, Saito TK, Hotta S |
32 - 37 |
Raman studies of aluminum induced microcrystallization of n(+) Si : H films produced by PECVD Rojas-Lopez M, Gayou VL, Perez-Blanco RE, Torres-Jacome A, Navarro-Contreras H, Vidal MA |
38 - 47 |
Transmission electron microscopy investigation of the effect of deposition conditions and a platinum layer in gas-sensitive r.f.-sputtered SnO2 films Serventi AM, Rickerby DG, Horrillo MC, Saint-Jacques RG |
48 - 53 |
Intrinsic stress and preferred orientation in TiN coatings deposited on Al using plasma immersion ion implantation assisted deposition Mukherjee S, Prokert F, Richter E, Moller W |
54 - 58 |
Microstructural and transport properties of LaNiO3-delta films grown on Si(111) by chemical solution deposition Escote MT, Pontes FM, Leite ER, Varela JA, Jardim RF, Longo E |
59 - 62 |
Evolutions of residual stress and microstructure in ZrO2 thin films deposited at different temperatures and rates Shao SY, Fan ZX, Shao JD, He HB |
63 - 71 |
Influence of DC magnetron sputtering parameters on the properties of amorphous indium zinc oxide thin film Jung YS, Seo HY, Lee DW, Jeon DY |
72 - 79 |
Electrodeposition of adherent copper film on unmodified tungsten Wang C, Lei JP, Bjelkevig C, Rudenja S, Magtoto N, Kelber J |
80 - 89 |
Three-dimensional deposition topography simulation based on new combinations of flux distribution and surface representation algorithms Kwon UH, Lee WJ |
90 - 95 |
Structure of ultrathin MgO films on Mo(001) Gallagher MC, Fyfield MS, Bumm LA, Cowin JP, Joyce SA |
96 - 104 |
Physical and mechanical properties of reactively sputtered chromium boron nitride thin films Gorishnyy TZ, Mihut D, Rohde SL, Aouadi SM |
105 - 111 |
Characterization of crystalline alumina films formed in alcohol-water solutions Geiculescu AC, Strange TF |
112 - 117 |
Titanium nitride diffusion barrier for copper metallization on gallium arsenide Chen HC, Tseng BH, Houng MP, Wang YH |
118 - 126 |
Optical waveguiding in amorphous tellurium oxide thin films Nayak R, Gupta V, Dawar AL, Sreenivas K |
127 - 130 |
Structural and magnetic properties of nanogranular Co-Pt/C films Wang AL, Li T, Zhou YS, Jiang HW, Zheng W |
131 - 137 |
Surface properties of LB monolayers composed of aminimide derivatives having two alkyl chains Matsuzawa Y, Matsumoto M |
138 - 143 |
Etch characteristics of silver by inductively coupled fluorine-based plasmas Park SD, Lee YJ, Kim SG, Choe HH, Hong MP, Yeom GY |
144 - 150 |
Surface electronic states in metal-porous silicon-silicon structures Tretyak OV, Skryshevsky VA, Vikulov VA, Boyko YV, Zinchuk VM |