화학공학소재연구정보센터

Thin Solid Films

Thin Solid Films, Vol.445, No.1 Entire volume, number list
ISSN: 0040-6090 (Print) 

In this Issue (22 articles)

1 - 6 Deposition and annealing effect on lanthanum sulfide thin films by spray pyrolysis
Bagde GD, Sartale SD, Lokhande CD
7 - 13 High dielectric constant in CaCu3Ti4O12 thin film prepared by pulsed laser deposition
Zhao YL, Pan GW, Ren QB, Cao YG, Feng LX, Jiao ZK
14 - 19 The effect of deposition parameters on the properties of yttria-stabilized zirconia thin films
Ruddell DE, Stoner BR, Thompson JY
20 - 25 Densification of In2O3: Sn multilayered films elaborated by the dip-coating sol-gel route
Daoudi K, Canut B, Blanchin MG, Sandu CS, Teodorescu VS, Roger JA
26 - 31 Conformational polymorphs in vacuum evaporated thin film of 5,5'''-bis[(2,2,5,5-tetramethyl-1-aza-2,5-disila-1-cyclopentyl)ethyl]-2,2': 5',2'': 5'',2'''-quaterthiophene
Muguruma H, Saito TK, Hotta S
32 - 37 Raman studies of aluminum induced microcrystallization of n(+) Si : H films produced by PECVD
Rojas-Lopez M, Gayou VL, Perez-Blanco RE, Torres-Jacome A, Navarro-Contreras H, Vidal MA
38 - 47 Transmission electron microscopy investigation of the effect of deposition conditions and a platinum layer in gas-sensitive r.f.-sputtered SnO2 films
Serventi AM, Rickerby DG, Horrillo MC, Saint-Jacques RG
48 - 53 Intrinsic stress and preferred orientation in TiN coatings deposited on Al using plasma immersion ion implantation assisted deposition
Mukherjee S, Prokert F, Richter E, Moller W
54 - 58 Microstructural and transport properties of LaNiO3-delta films grown on Si(111) by chemical solution deposition
Escote MT, Pontes FM, Leite ER, Varela JA, Jardim RF, Longo E
59 - 62 Evolutions of residual stress and microstructure in ZrO2 thin films deposited at different temperatures and rates
Shao SY, Fan ZX, Shao JD, He HB
63 - 71 Influence of DC magnetron sputtering parameters on the properties of amorphous indium zinc oxide thin film
Jung YS, Seo HY, Lee DW, Jeon DY
72 - 79 Electrodeposition of adherent copper film on unmodified tungsten
Wang C, Lei JP, Bjelkevig C, Rudenja S, Magtoto N, Kelber J
80 - 89 Three-dimensional deposition topography simulation based on new combinations of flux distribution and surface representation algorithms
Kwon UH, Lee WJ
90 - 95 Structure of ultrathin MgO films on Mo(001)
Gallagher MC, Fyfield MS, Bumm LA, Cowin JP, Joyce SA
96 - 104 Physical and mechanical properties of reactively sputtered chromium boron nitride thin films
Gorishnyy TZ, Mihut D, Rohde SL, Aouadi SM
105 - 111 Characterization of crystalline alumina films formed in alcohol-water solutions
Geiculescu AC, Strange TF
112 - 117 Titanium nitride diffusion barrier for copper metallization on gallium arsenide
Chen HC, Tseng BH, Houng MP, Wang YH
118 - 126 Optical waveguiding in amorphous tellurium oxide thin films
Nayak R, Gupta V, Dawar AL, Sreenivas K
127 - 130 Structural and magnetic properties of nanogranular Co-Pt/C films
Wang AL, Li T, Zhou YS, Jiang HW, Zheng W
131 - 137 Surface properties of LB monolayers composed of aminimide derivatives having two alkyl chains
Matsuzawa Y, Matsumoto M
138 - 143 Etch characteristics of silver by inductively coupled fluorine-based plasmas
Park SD, Lee YJ, Kim SG, Choe HH, Hong MP, Yeom GY
144 - 150 Surface electronic states in metal-porous silicon-silicon structures
Tretyak OV, Skryshevsky VA, Vikulov VA, Boyko YV, Zinchuk VM