1 - 3 |
Electrochemical Switching to P-Type and N-Type Semiconductance with Poly(3-Methyl Thiophene) Film Chowdhury AN, Kunugi Y, Harima Y, Yamashita K |
4 - 7 |
Single-Source MOVPE Growth of Zinc-Sulfide Thin-Films Using Zinc Dithiocarbamate Complexes Nomura R, Murai T, Toyosaki T, Matsuda H |
8 - 14 |
Gaseous Oxidation and Compensating Reduction of Lutetium bis-Phthalocyanine and Lutetium Phthalo-Naphthalocyanine Films Passard M, Blanc JP, Maleysson C |
15 - 18 |
Structure and Composition of (Ti,Al)N Films Prepared by RF Planar Magnetron Sputtering Using a Composite Target Inoue S, Uchida H, Hioki A, Koterazawa K, Howson RP |
19 - 25 |
Evaluation of Porosity and Composition in Reactively RF-Sputtered Ti1-Xzrxn Films Jin P, Nakao S, Tanemura S, Maruno S |
26 - 34 |
The Role of Reactive Diffusion in the Growth-Kinetics of the Icosahedral Quasi-Crystalline Al4Mn Phase - Case of Sequentially Deposited Thin-Films Zsigmond G |
35 - 38 |
Deposition and Characterization of ZnO Thin-Films Grown by Chemical Bath Deposition Saeed T, Obrien P |
39 - 49 |
Demonstration of a Method to Fabricate a Large-Area Diamond Single-Crystal Posthill JB, Malta DP, Hudson GC, Thomas RE, Humphreys TP, Hendry RC, Rudder RA, Markunas RJ |
50 - 55 |
Effect of Hydrogen Addition on the Preferred Orientation of AlN Films Prepared by Reactive Sputtering Lee HC, Lee KY, Yong YJ, Lee JY, Kim GH |
56 - 63 |
Deposition of Amorphous-Carbon Layers from C2H2 and CF4 with an Expanding Thermal Arc Plasma Beam Set-Up Gielen JW, Vandesanden MC, Schram DC |
64 - 68 |
A Comparative-Study of Hillock Formation in Aluminum Films Martin BC, Tracy CJ, Mayer JW, Hendrickson LE |
69 - 72 |
Deposition of Mixed-Metal Oxides by MOCVD and PECVD Cao ZR, Owen JR |
73 - 83 |
2nd-Harmonic Generation in Self-Assembled Alternating Multilayers of Hemicyanine Containing Polymers and Polyvinylamine Beyer D, Paulus W, Seitz M, Maxein G, Ringsdorf H, Eich M |
84 - 87 |
Oxidation of Zinc Particles Vacuum-Deposited in a High-Resolution Transmission Electron-Microscope Isshiki T, Ohta M, Nishio K, Shiojiri M |
88 - 91 |
Friction and Wear of the Film Formed in the Immersion Test of Oil Containing Antiwear and Extreme-Pressure Additives Liu WM, Hu LT, Zhang ZF |
92 - 95 |
Preparation and Tribological Properties of Sputtered Polyimide Film Kitoh M, Honda Y |
96 - 100 |
Pyrolytic Laser-Based Chemical-Vapor-Deposition of TiC Coatings Zergioti I, Hatziapostolou A, Hontzopoulos E, Zervaki A, Haidemenopoulos GN |
101 - 107 |
Scratch Test Adhesion and Hardness Evaluation of Sputtered Nb Coatings as a Function of the Argon Gas-Pressure Ward LP, Datta PK |
108 - 116 |
Growth and Mechanical Anisotropy of Tin Thin-Films Meng WJ, Eesley GL |
117 - 121 |
Defect Structure at a CdTe(111)/GaAs(001) Interface Angelo JE, Gerberich WW, Bratina G, Sorba L, Franciosi A |
122 - 131 |
Finite-Element Analysis of Plastic-Deformation of Various Tin Coating Substrate Systems Under Normal Contact with a Rigid Sphere Sun Y, Bloyce A, Bell T |
132 - 137 |
Solar-Cells and High-Efficiency Photo-Diodes Having Metal-Organic Thin Film-Semiconductor Structures Almohamad A, Soukieh M |
138 - 143 |
Autoxidative Oligomerization of an Amphiphilic Aniline in Monolayers at the Air-Water-Interface Sagisaka S, Yoshida S, Ando M, Iyoda T, Shimidzu T |
144 - 146 |
Nucleation and Growth of Gold on Polypyrrole Investigated by Quantitative XPS and STM Heuberger M, Tresch S, Dietler G |
147 - 150 |
Multiphonon Raman-Scattering in ZnSe/Zn0.80Cd0.20Se Superlattices Li WS, Fan XW, Yang BJ, Shen DZ, Lu YM, Zhang JY, Chen LC, Chi YB, Li YM |
151 - 156 |
Bond Switching, Si-H Cluster Formation and Hydrogen Effusion upon Thermal Annealing in Hydrogenated Amorphous-Silicon Thin-Films Ruther R, Livingstone J, Dytlewski N, Cohen D |