Thin Solid Films

Thin Solid Films, Vol.332, No.1-2 Entire volume, number list

ISSN: 0040-6090 (Print)

In this Issue (80 articles)

1 - 9	Implementation of micromirror arrays as optical binary switches and amplitude modulators Kolesar ES, Allen PB, Wilken JW, Howard JT
10 - 15	Laser induced chemical vapor deposition of optical thin films on curved surfaces Tamir S, Berger S, Rabinovitch K, Gilo M, Dahan P
16 - 20	Process monitoring and control of low temperature reactively sputtered AlN Kirkpatrick SR, Rohde SL, Mihut DM, Kurruppu ML, Swanson JR, Thomson D, Woollam JA
21 - 24	Deposition of tungsten thin films by dual frequency inductively coupled plasma assisted CVD Colpo P, Rossi F, Gibson N, Gilliland D
25 - 29	Ellipsometry and transport studies of thin-film metal nitrides Humlicek J, Nebojsa A, Hora J, Strasky M, Spousta J, Sikola T
30 - 33	Correlation of predicted and observed optical properties of multilayer thermal control coatings Jaworske DA
34 - 39	Highly transparent nano-crystalline diamond films via substrate pretreatment and methane fraction optimization Chen KH, Bhusari DM, Yang JR, Lin ST, Wang TY, Chen LC
40 - 45	Thick SiOxNy and SiO2 films obtained by PECVD technique at low temperatures Alayo MI, Pereyra I, Carreno MNP
46 - 49	Optical properties of RF sputtered strontium substituted barium titanate thin films Panda B, Dhara A, Nigam GD, Bhattacharya DB, Ray SK
50 - 55	Extremely fast ellipsometry solutions using cascaded neural networks alone Urban FK, Barton D, Boudani NI
56 - 61	Properties of carbon nitride films deposited by magnetron sputtering Kusano Y, Evetts JE, Somekh RE, Hutchings IM
62 - 68	Vibrational properties of carbon nitride films by Raman spectroscopy Chowdhury AKMS, Cameron DC, Hashmi MSJ
69 - 73	Preparation of CNx-phases using plasma-assisted and hot filament chemical vapour deposition Leonhardt A, Gruger H, Selbmann D, Arnold B, Thomas J
74 - 79	Sputtering process of carbon nitride films by using a novel bio-molecular C-N containing target Lu TR, Chen LC, Chen KH, Bhusari DM, Chen TM, Kuo CT
80 - 86	Structures and properties of disordered boron carbide coatings generated by magnetron sputtering Hu T, Steihl L, Rafaniello W, Fawcett T, Hawn DD, Mashall JG, Rozeveld SJ, Putzig CL, Blackson JH, Cermignani W, Robinson MG
87 - 92	A technique for large area deposition of diamond via combustion flame synthesis Rozbicki RT, Sarin VK
93 - 97	Microwave plasma chemical vapor deposition of diamond films with low residual stress on large area porous silicon substrates Khan MA, Haque MS, Naseem HA, Brown WD, Malshe AP
98 - 102	DC electrical conductivity of chemical vapour deposited diamond sheets : a correlation with hydrogen content and paramagnetic defects Sikder AK, Jacob AP, Sharda T, Misra DS, Pandey M, Kabiraj D, Avasthi DK
103 - 108	The investigation of thermal effect on the properties of pulsed laser deposited diamond-like carbon films Jung HS, Park HH, Pang SS, Lee SY
109 - 112	Thermal diffusion in molecular dynamics simulations of thin film diamond deposition Pailthorpe BA, Mitchell D, Bordes NS
113 - 117	On the hardness of a-C : H films prepared by methane plasma decomposition Marques FC, Lacerda RG, Odo GY, Lepienski CM
118 - 123	The microstructural dependence of the opto-electronic properties of nitrogenated hydrogenated amorphous carbon thin films Silva SRP, Khan RUA, Burden AP, Anguita JV, Shannon JM, Sealy BJ, Papworth AJ, Kiely CJ, Amaratunga GAJ
124 - 129	Influence of water vapour and oxygen on the tribological behaviour of diamond coatings steel couple Schmitt M, Paulmier D, Le Huu T, El Mansori M, Grabchenko A, Mamalis AG
130 - 135	Structural modifications and temperature stability of silicon incorporated diamond-like a-C : H films Camargo SS, Santos RA, Neto ALB, Carius R, Finger F
136 - 140	Diamond deposition from methanol-hydrogen-water mixed gas using a low pressure, radio frequency, inductively-coupled plasma Hiramatsu M, Noda H, Nagai H, Shimakura M, Nawata M
141 - 145	Gas desorption and adsorption properties of carbon based material used for cathode ray tube Hashiba M, Hino T, Hirohata Y, Shinbori H, Deyama S, Chiyoda H
146 - 150	Influence of stress distribution on adhesion strength of sputtered hard coatings Tonshoff HK, Karpuschewski B, Mohlfeld A, Seegers H
151 - 156	The nano-scratch tester (NST) as a new tool for assessing the strength of ultrathin hard coatings and the mar resistance of polymer films Consiglio R, Randall NX, Bellaton B, von Stebut J
157 - 163	A laser-acoustic method for testing and classifying hard surface layers Schneider D, Schultrich B, Scheibe HJ, Ziegele H, Griepentrog M
164 - 171	Mechanical properties of SiO2 and Si3N4 coatings : a BAM/NIST co-operative project Beck U, Smith DT, Reiners G, Dapkunas SJ
172 - 179	Indentation of graded substrates Giannakopoulos AE
180 - 184	Crack formation mechanisms during micro and macro indentation of diamond-like carbon coatings on elastic-plastic substrates Thomsen NB, Fischer-Cripps AC, Swain MV
185 - 188	Strength of HVOF coating-substrate interfaces Nygards CM, White KW, Ravi-Chandar K
189 - 194	Measurement of the micro mechanical properties of sol-gel TiO2 films Jamting AK, Bell JM, Swain MV, Wielunski LS, Clissold R
195 - 201	Mechanical properties of W and W(C) thin films : Young's modulus, fracture toughness and adhesion Harry E, Rouzaud A, Ignat M, Juliet P
202 - 208	Comparison of mechanical properties of TiN thin films using nanoindentation and bulge test Shojaei OR, Karimi A
209 - 214	Electronic structure and chemical characterization of ultrathin insulating films Sanz JM, Soriano L, Prieto P, Tyuliev G, Morant C, Elizalde E
215 - 219	Depth profiling of non-conductive oxidic multilayers with plasma-based SNMS in HF-mode Goschnick J, Natzeck C, Sommer M, Zudock F
220 - 224	Electrical and microwave characterization of kanthal thin films : temperature and size effect Bhat KS, Datta SK, Suresh C
225 - 229	Hexagonal nitride coatings : electronic and mechanical properties of V2N, Cr2N and delta-MoN Sanjines R, Hones P, Levy F
230 - 234	Surface- and microanalytical characterization of silicon-carbonitride thin films prepared by means of radio-frequency magnetron co-sputtering Lutz H, Bruns M, Link F, Baumann H
235 - 239	Corrosion of titanium-nitride encapsulated silver films exposed to a H2S ambient Adams D, Julies BA, Mayer JW, Alford TL
240 - 246	Sputter deposited chromium nitride based ternary compounds for hard coatings Hones P, Sanjines R, Levy F
247 - 251	Effect of external magnetic field on c-axis orientation and residual stress in AlN films Kusaka K, Ao T, Hanabusa T, Tominaga K
252 - 256	Microstructural characterisation of carbonaceous dust generated during the deposition of diamond-like carbon coatings Burden AP, Anguita JV, Silva SRP
257 - 261	Technique for characterization of thin film porosity Taylor DJ, Fleig PF, Hietala SL
262 - 266	Secondary electron imaging of nucleation and growth of semiconductors for nanostructure fabrication Homma Y
267 - 271	Structural and electrochromic properties of InN thin films Asai N, Inoue Y, Sugimura H, Takai O
272 - 276	Characterizing and modeling the apparent anomalous behavior of resistivity in Cr-Si-O thin films Jankowski AF
277 - 281	Structural studies of ITO thin films with the Rietveld method Quaas M, Eggs C, Wulff H
282 - 289	On the energy influx to the substrate during sputter deposition of thin aluminium films Kersten H, Kroesen GMW, Hippler R
290 - 294	Raman microscopy study of pulsed laser ablation deposited silicon carbide films Neri F, Trusso S, Vasi C, Barreca F, Valisa P
295 - 299	Study on chromium oxide synthesized by unbalanced magnetron sputtering Wang DY, Lin JH, Ho WY
300 - 304	Effect of excess Pb and O content on the ferroelectric properties of sputter deposited Pb(Zr0.52Ti0.48)O-3/Pt system Park HH, Jin IS, Kim DH, Kim TS
305 - 311	A study on the structural distribution of Se-passivated GaAs surface Kim JW, Sa SH, Kang MG, Park HH
312 - 318	Texture and surface roughness of PRCVD aluminum films Yang D, Jonnalagadda R, Rogers BR, Hillman JT, Foster RF, Cale TS
319 - 324	A low temperature integrated aluminum metallization technology for ULSI devices Guo T, Chen LY, Brown D, Besser P, Voss S, Mosely R
325 - 328	Evaluation of tantalum silicide sputtering target materials for amorphous Ta-Si-N diffusion barrier for Cu metallization Ivanov E
329 - 334	Characterization of a PECVD WxN process using N-2, H-2, and WF6 Lai KK, Mak AW, Wendling TPHF, Jian P, Hathcock B
335 - 339	TiN reactive sputter deposition studied as a function of the pumping speed Heuvelman WM, Helderman P, Janssen GCAM, Radelaar S
340 - 344	Synthesis and processing of a Cu-In-Ga-Se sputtering target Suryanarayana C, Ivanov E, Noufi R, Contreras MA, Moore JJ
345 - 350	The effects of plasma treatment for low dielectric constant hydrogen silsesquioxane (HSQ) Liu PT, Chang TC, Sze SM, Pan FM, Mei YJ, Wu WF, Tsai MS, Dai BT, Chang CY, Shih FY, Huang HD
351 - 355	Enhancing the thermal stability of low dielectric constant hydrogen silsesquioxane by ion implantation Chang TC, Chou MF, Mei YJ, Tsang JS, Pan FM, Wu WF, Tsai MS, Chang CY, Shih FY, Huang HD
356 - 361	Uncooled thin film infrared imaging device with aerogel thermal isolation : deposition and planarization techniques Ruffner JA, Clem PG, Tuttle BA, Brinker CJ, Sriram CS, Bullington JA
362 - 368	Precursor selection for plasma deposited fluorinated amorphous Mountsier TW, Samuels JA
369 - 374	Properties of low dielectric constant fluorinated silicon oxide films prepared by plasma enhanced chemical vapor deposition Kim K, Kwon D, Lee GS
375 - 378	MOS capacitor characteristics of plasma oxide on partially strained SiGeC films Ray SK, Bera LK, Maiti CK, John S, Banerjee SK
379 - 384	Assessment of post-CMP cleaning mechanisms using statistically-designed experiments Zhang G, Burdick G, Dai F, Bibby T, Beaudoin S
385 - 390	A modified multi-chemical spray cleaning process for post shallow trench isolation chemical mechanical polishing cleaning application Wang YL, Wang TC, Wu J, Tseng WT, Lin CF
391 - 396	Chemical-mechanical polishing for giant magnetoresistance device integration Hu YZ, Gutmann RJ, Chow TP, Witcraft B
397 - 403	Material characteristics and chemical-mechanical polishing of aluminum alloy thin films Wang YL, Wu J, Liu CW, Wang TC, Dun JW
404 - 411	Advanced salicides for 0.10 mu m CMOS : Co salicide processes with low diode leakage and Ti salicide processes with direct formation of low resistivity C54 TiSi2 Kittl JA, Hong QZ, Yang H, Yu N, Samavedam SB, Gribelyuk MA
412 - 417	Selective deposition of TiSi2 on ultra-thin silicon-on-insulator (SOI) wafers Maa JS, Ulrich B, Hsu ST, Stecker G
418 - 422	The effects of the process parameters on the electrical and microstructure characteristics of the CrSi thin resistor films : part I Wu F, McLaurin AW, Henson KE, Managhan DG, Thomasson SL
423 - 427	Characterization of multilayered Ti/TiN films grown by chemical vapor deposition Hu JC, Chang TC, Chen LJ, Yang YL, Chang CY
428 - 436	Low parasitic resistance contacts for scaled ULSI devices Osburn CM, Bellur KR
437 - 443	Effect of GaAs surface treatments using HCl or (NH4)(2)S-x solutions on the interfacial bonding states induced by deposition of Au Kang MG, Park HH
444 - 448	Effect of O-2 plasma treatment on the properties of SiO2 aerogel film Kim HR, Park HH, Hyun SH, Yeom GY
449 - 454	The effect of sol viscosity on the sol-gel derived low density SiO2 xerogel film for intermetal dielectric application Hong JK, Kim HR, Park HH
XIII - XIII	Papers presented at the 25th International Conference on Metallurgical Coatings and Thin Films, San Diego, CA, USA, April 27 May 1, 1998 - Preface Sartwell BD, Givens JH, Mitterer C, Rhode SL