1 - 4 |
Influences of bias voltage on the crystallographic orientation of AlN thin films prepared by long-distance magnetron sputtering Chu AK, Chao CH, Lee FZ, Huang HL |
5 - 12 |
Thin films of the double perovskite Sr2FeMoO6 deposited by pulsed laser deposition Borges RR, Lhostis S, Bari MA, Versluijs JJ, Lunney JG, Coey JMD, Besse M, Contour JP |
13 - 21 |
Transparent photocatalytic films deposited on polymer substrates from sol-gel processed titania sols Langlet M, Kim A, Audier M, Guillard C, Herrmann JM |
22 - 27 |
Cubic boron nitride films deposited by unbalanced RF magnetron sputtering and pulsed DC substrate bias Ding XZ, Zeng XT, Xie H |
28 - 33 |
Preparation and characterization of amorphous GaF3 and GaF3-BaF2 thin films by ECR microwave plasma-enhanced CVD Takahashi S, Shojiya M, Kawamoto Y, Konishi A |
34 - 39 |
Highly oriented CdS films deposited by an ammonia-free chemical bath method Lopez MBO, Valenzuela-Jauregui JJ, Sotelo-Lerma M, Mendoza-Galvan A, Ramirez-Bon R |
40 - 45 |
Growth and properties of sputtered zirconia and zirconia-silica thin films Kuo DH, Chien CH |
46 - 54 |
Conformal deposition of Ti-C : H coatings over high-aspect-ratio micro-scale structures and tribological characteristics Cao DM, Meng W, Simko SJ, Doll GL, Wang I, Kelly KW |
55 - 62 |
Defect structure of pulsed laser deposited LiNbO3/Al2O3 layers determined by X-ray diffraction reciprocal space mapping Boulle A, Canale L, Guinebretiere R, Girault-Di Bin C, Dauger A |
63 - 70 |
Nanocrystalline diamond films produced by direct current arc plasma jet process Tang W, Zhu C, Yao W, Wang Q, Li C, Lu F |
71 - 76 |
Ultrathin PMMA films spin-coated from toluene solutions Walsh CB, Franses EI |
77 - 83 |
Thermodynamic study and characterization of low pressure chemically vapor deposited silicon oxynitride films from tetraethylorthosilicate, dichlorosilane and ammonia gas mixtures Vamvakas VE, Davazoglou D, Berjoan R, Schamm S, Vahlas C |
84 - 90 |
Optical and crystallisation behaviour of TiO2 and V/TiO2 thin films prepared by plasma and ion beam assisted methods Gracia F, Holgado JP, Contreras L, Girardeau T, Gonzalez-Elipe AR |
91 - 95 |
Residual carbon and carrier concentration in InGaP layers grown by chemical beam epitaxy Bettini J, de Carvalho MMG, Pudenzi MAA, Laureto E, Meneses EA |
96 - 101 |
A comparative Raman study of some transition metal fullerides Talyzin AV, Jansson U |
102 - 107 |
A sol-gel method to prepare pure and gold colloid doped ZnO films Wang XH, Shi HL, Dai SG, Yang Y |
108 - 113 |
Influence of plasma power over growth rate and grain size during diamond deposition using DC arc plasma jet CVD Huang TB, Tang WZ, Lu FX, Ali N, Gracio J |
114 - 118 |
Effect of La doping on structural and electrical properties of ferroelectric Bi4-xLaxTi3O12 thin films prepared by chemical solution deposition Kim HI, Song YS, Sok J, Chung CW |
119 - 128 |
First stages of Ni deposition onto vitreous carbon from sulfate solutions Munoz AG, Salinas DR, Bessone JB |
129 - 134 |
Electrical and optical properties of reactive DC magnetron sputtered silver oxide thin films: role of oxygen Barik UK, Srinivasan S, Nagendra CL, Subrahmanyam A |
135 - 143 |
Correlation between structure, stress and optical properties in direct current sputtered molybdenum oxide films Mohamed SH, Kappertz O, Ngaruiya JM, Pedersen TPL, Drese R, Wuttig M |
144 - 151 |
SiCN alloys obtained by remote plasma chemical vapour deposition from novel precursors Smirnova TP, Badalian AM, Yakovkina LV, Kaichev VV, Bukhtiyarov VI, Shmakov AN, Asanov IP, Rachlin VI, Fomina AN |
152 - 158 |
Effect of different substituents on conducting character of azos and local states of azo/TiOPc composites Cao J, Sun JZ, Wang M, Chen HZ, Zhou XQ, Wang DJ |
159 - 166 |
Formation of N2O gas bubbles in anodic films on NbNx alloys Habazaki H, Matsuo T, Konno H, Shimizu K, Nagata S, Takayama K, Oda Y, Skeldon P, Thompson GE |
167 - 173 |
A covalently attached film based on poly (methacrylic acid)-capped Fe3O4 nanoparticles Zhang H, Wang RB, Zhang G, Yang B |
174 - 178 |
Formation mechanism of a black layer between TiN and ion-nitrided steel treated in a duplex process Baek WS, Kwon SC, Rha JJ, Chae BG, Lee JY |
179 - 189 |
Stress analysis and microstructure of PVD monolayer TiN and multilayer TiN/(Ti,Al)N coatings Carvalho NJM, Zoestbergen E, Kooi BJ, De Hosson JTM |
190 - 200 |
Residual stress measurement in thin carbon films by Raman spectroscopy and nanoindentation Taylor CA, Wayne MF, Chiu WKS |
201 - 210 |
Fracture toughness, adhesion and mechanical properties of low-K dielectric thin films measured by nanoindentation Volinsky AA, Vella JB, Gerberich WW |
211 - 215 |
The growth of the CdxZn1-xTe epilayers by low-pressure metalorganic vapor-phase epitaxy Zhang ZZ, Shen DZ, Shan CX, Zhang JY, Lu YM, Liu YC, Fan XW |
216 - 219 |
Enhanced phase stability and morphological stability of Ni(Si,Ge) on strained Si0.8Ge0.2 Seger J, Zhang SL |
220 - 224 |
Nitrogen as background gas in pulsed-laser deposition growth of indium tin oxide films at room temperature Morales-Paliza MA, Huang MB, Feldman LC |
225 - 230 |
Sol-gel deposited TiO2 film on NiTi surgical alloy for biocompatibility improvement Liu JX, Yang DZ, Shi F, Cai YJ |
231 - 237 |
Electrical and mechanical properties of low temperature evaporated silicon dioxide/polyimide dual-layer insulator for plastic-based polymer transistor Park SK, Kim YH, Han JI, Moon DG, Kim WK |
238 - 242 |
Dielectric properties of anodic films formed on sputtering-deposited tantalum in phosphoric acid solution Lu Q, Mato S, Skeldon P, Thompson GE, Masheder D |
243 - 247 |
Type-II Zn1-xMnxSe/ZnSe1-yTey quantum wells Yang CS, Cheng CC, Kuo MC, Tseng PY, Shen JL, Lee J, Chou WC, Jeng S, Lai CY, Hsu TM, Chyi JI |
248 - 254 |
Stability of silver thin films on various underlying layers at elevated temperatures Alford TL, Chen LH, Gadre KS |
255 - 260 |
Effect of hydrogen remote plasma annealing on the characteristics of copper film Choi KK, Yun JH, Rhee SW |
261 - 266 |
Field electron emission characteristics of nitrogenated tetrahedral amorphous carbon films Zhang XW, Cheung WY, Wong SP |
267 - 272 |
Atomic force microscopy observations of successive damaging mechanisms of thin films on substrates under tensile stress George M, Coupeau C, Colin J, Grilhe J |
273 - 281 |
Very thin solid-on-liquid structures: the interplay of flexural rigidity, membrane force, and interfacial force Huang R, Suo Z |
282 - 285 |
An interfacial defect layer observed at (Ba,Sr)TiO3/Pt interface Jin HZ, Zhu J, Ehrhart P, Fitsilis F, Jia CL, Regnery S, Urban K, Waser R |
286 - 294 |
Spectroscopic ellipsometry of electrochemically prepared thin film polyaniline Al-Attar HA, Al-Alawina QH, Monkman AP |