1 - 8 |
Analysis of the sidewall films formed during Si trench etching with photoresist mask in Cl-2/HBr-based plasma Lee SD, Nam SY, Ha JH, Park JW |
9 - 14 |
Associative oxygen species on the oxidized silver surface formed under O-2 microwave excitation Boronin AI, Koscheev SV, Murzakhmetov KT, Avdeev VI, Zhidomirov GM |
15 - 22 |
The surface structure of Dow Cyclotene 3022, as determined by photoacoustic FTIR, confocal Raman and photoelectron spectroscopies Poulin S, Yang DQ, Sacher E, Hyett C, Ellis TH |
23 - 33 |
Initial stages of oxidation of a 9CrMoV-steel: role of segregation and martensite laths Tokei Z, Viefhaus H, Grabke HJ |
34 - 37 |
XPS analysis of Pb(Zr0.52Ti0.48) O-3 thin film after dry-etching by CHF3 plasma Lin YY, Liu Q, Tang TA, Yao X |
38 - 43 |
Scanning tunneling microscopy observation of dislocations with superlattice structure in graphite Ouseph PJ |
44 - 55 |
Ion time-of-flight analysis of ultrashort pulsed laser-induced processing of Al2O3 Stoian R, Varel H, Rosenfeld A, Ashkenasi D, Kelly R, Campbell EEB |
56 - 59 |
Preparation and electrochromic properties of Li-doped MoO3 films fabricated by the peroxo sol-gel process Zhang YZ, Kuai S, Wang ZC, Hu XF |
60 - 69 |
Systematic study of the surface morphology of ordered (GaIn)P Pietzonka I, Sass T, Gottschalch V |
70 - 84 |
Analysis of the NiCo2O4 spinel surface with Auger and X-ray photoelectron spectroscopy Kim JG, Pugmire DL, Battaglia D, Langell MA |