Applied Surface Science

Applied Surface Science, Vol.193, No.1-4 Entire volume, number list

ISSN: 0169-4332 (Print)

In this Issue (34 articles)

1 - 10	XRD, SEM, AFM, HRTEM, EDAX and RBS studies of chemically deposited Sb2S3 and Sb2Se3 thin films Lokhande CD, Sankapal BR, Mane RS, Pathan HM, Muller M, Giersig M, Ganesan V
11 - 25	Secondary ion emission matrix effects in a metal overlayer system: CO and O-2 adsorption on Cu/Ni(100) Karolewski MA, Cavell RG
26 - 35	Thermodynamical computation and physicochemical characterization of thin films deposited by electric-discharge-assisted chemical vapor deposition Sassi Z, Chafik K, Bureau JC, Glachant A, Balland B
36 - 45	Preparation and characterization of semi-conductive poly(vinylidene fluoride)/polyaniline blends and membranes Wang P, Tan KL, Kang ET, Neoh KG
46 - 51	Periodic microstructure induced by 532 nm polarized laser illumination on poly(urethane-imide) film: orientation of the azobenzene chromophore Li M, Lu QH, Yin J, Sui Y, Li G, Qian Y, Wang ZG
52 - 59	ZnO : Al thin films obtained by chemical spray: effect of the Al concentration Mondragon-Suarez H, Maldonado A, Olvera MDL, Reyes A, Castanedo-Perez R, Torres-Delgado G, Asomoza R
60 - 69	Production of H- from heated SrH2 powder and from H-2 introduced onto the powder Kawano H, Iseki T
70 - 76	Atomic structures of TiO2(110) surface between p(1 x 1) and p(1 x 2) studied by scanning tunneling microscopy Asari E, Souda R
77 - 82	Low temperature effect on the electron beam induced degradation of ZnS : Cu,Al,Au phosphor powders Hillie KT, Swart HC
83 - 86	Fabrication of composite coating particles with mullite stoichiometric ratio by a novel processing Tang YF, Li AD, Ling HQ, Wang YJ, Shao QY, Lu YN, Ling ZD
87 - 91	Formation of carbon nanowires by annealing silicon carbide films deposited by magnetron sputtering An X, Zhuang HZ, Yang L, Xue CS
92 - 101	Ion-implanted waveguides in Nd3+-doped silicate glass and Er3+/Yb3+ co-doped phosphate glass Chen F, Wang XL, Li XS, Hu LL, Lu QM, Wang KM, Shi BR, Shen DY
102 - 119	Improved adhesion of diamond coating on cobalt-cemented tungsten carbide hardmetal by using pulsed-UV-laser substrate surface pretreatment Li TJ, Lou QH, Dong JX, Wei YR, Zhou J, Liu JR, Zhang ZM, Sun FH
120 - 128	Synthesis of ZrO2 thin films by atomic layer deposition: growth kinetics, structural and electrical properties Cassir M, Goubin F, Bernay C, Vernoux P, Lincot D
129 - 137	Surface structure and field emission property of carbon nanotubes grown by radio-frequency plasma-enhanced chemical vapor deposition Jung YS, Jeon DY
138 - 143	Structural properties of hydrogenated amorphous silicon carbide alloys Wang Y, Yue RF, Liu LT
144 - 148	X-ray photoelectron spectroscopy studies of the effects of plasma etching on amorphous carbon nitride films Jiang LD, Fitzgerald AG, Rose MJ, Cheung R, Rong B, van der Drift E
149 - 155	Laser ablation and time-of-flight mass-spectrometric study of SiO Torres R, Martin M
156 - 166	Surface roughness influence on photothermal radiometry Walther HG
167 - 174	Electrochemical behavior of brass in 0.1 M NaCl Kabasakaloglu M, Kiyak T, Sendil O, Asan A
175 - 179	Enhanced hydrogen stability in a-Si : H thin films evaporated under a flow of energetic argon ions Rinnert H, Vergnat M
180 - 188	The parameters of back-scattered ions studied as a function of target temperature Baranov MA, Baynkin VY
189 - 194	Interaction of aluminium with stainless steel during plasma nitriding Gredelj S, Gerson AR, Kumar S, Cavallaro GP
195 - 203	Adsorption characteristics of organic long chain molecules during physical vapor deposition Kubono A, Yuasa N, Shao HL, Umemoto S, Okui N
204 - 209	Thermochemical process occurring in PLD-derived SiC films during vacuum annealing Wang YX, He HP, Wang LW, Liu D, Tang HG
210 - 216	Influence of the electrodeposition parameters on surface morphology and local magnetic properties of thin iron layers Jartych E, Jalochowski M, Budzynski M
217 - 223	Magnetism of ultrathin Fe films on GaAs(100) investigated by photoelectron spectroscopy Zhang T, Takahashi N, Spangenberg M, Shen TH, Seddon EA, Greig D, Matthew JAD
224 - 244	Molecular dynamics simulation of ionized cluster beam deposition using the tight-binding model Ju SP, Weng CI
245 - 253	Comparison of the early stages of corrosion of copper and iron investigated by in situ TM-AFM Kleber C, Weissenrieder J, Schreiner M, Leygraf C
254 - 260	Preparation and structural properties for GaN films grown on Si (111) by annealing Yang YG, Ma HL, Xue CS, Zhuang HZ, Hao XT, Ma J, Teng SY
261 - 267	Pulsed laser deposition of Nd : YAG on Si with substrate bias voltage Rumianowski R, Rozploch F, Dygdala RS, Kulesza S, Plociennik P, Wojtowicz A
268 - 276	Spectroscopic ellipsometry of non-absorbing films independent of film thickness Martinez-Anton JC, Gomez-Pedrero JA
277 - 286	Atomic layer deposition of TiO2 thin films from TiI4 and H2O Aarik J, Aidla A, Uustare T, Kukli K, Sammelselg V, Ritala M, Leskela M
287 - 292	Preparation of anatase and rutile thin films by controlling oxygen partial pressure Syarif DG, Miyashita A, Yamaki T, Sumita T, Choi Y, Itoh H