Applied Surface Science

Applied Surface Science, Vol.181, No.3-4 Entire volume, number list

ISSN: 0169-4332 (Print)

In this Issue (20 articles)

179 - 184	Fabrication and characterization of GaAs MIS devices with N-rich PECVD SixNy dielectric Pal S, Bose DN
185 - 190	Composition structure and magnetisation of rf plasma nitrided 304 stainless steel El-Hossary FM, Negm NZ
191 - 195	XPS and AES investigation of nanometer composite coatings of Ni-P-ZnX on steel surface (ZnX = ZnSnO3, Zn-3(PO4)(2), ZnSiO3) Pan T, Ma MH, Xin FB, Xin XQ
196 - 200	Fabrication of chromium oxide nanoparticles by laser-induced deposition from solution Zhong ZC, Cheng RH, Bosley J, Dowben PA, Sellmyer DJ
201 - 210	In situ XPS studies of thermally deposited potassium on poly (p-phenylene vinylene) and its ring-substituted derivatives Li S, Kang ET, Neoh KG, Ma ZH, Tan KL, Huang W
211 - 224	Characterization of uranium oxide thin films grown from solution onto Fe surfaces Qiu SR, Amrhein C, Hunt ML, Pfeffer R, Yakshinskiy B, Zhang L, Madey TE, Yarmoff JA
225 - 233	Laser-induced breakdown spectroscopy for on-line control of selective removal of cobalt binder from tungsten carbide hardmetal by pulsed UV laser surface ablation Li TJ, Lou QH, Wei YR, Huang F, Dong JX, Liu JR
234 - 238	Synthesis of well-aligned carbon nanotube network on a gold-patterned quartz substrate Cao AY, Zhang XF, Xu CL, Liang J, Wu DH, Wei BQ
239 - 247	Observation of short-wavelength recorded marks in TeOx thin film by atomic force microscopy Li QH, Gan FX
248 - 254	Controlled synthesis of aligned carbon nanotube arrays on catalyst patterned silicon substrates by plasma-enhanced chemical vapor deposition Wang H, Lin J, Huan CHA, Dong P, He J, Tang SH, Eng WK, Thong TLJ
255 - 264	Electrical conductivity of gamma-Al2O3 at atmospheric pressure under dehydrating/hydrating conditions Caldararu M, Postole G, Hornoiu C, Bratan V, Dragan M, Ionescu NI
265 - 276	Adsorption and dissociation reaction of carbon dioxide on Ni(111) surface: molecular orbital study Choe SJ, Kang HJ, Park DH, Huh DS, Park J
277 - 282	Some structural studies on successive ionic layer adsorption and reaction (SILAR)-deposited US thin films Lokhande CD, Sankapal BR, Pathan HM, Muller M, Giersig M, Tributsch H
283 - 295	Development of a technique to prevent radiation damage of chromate conversion coatings during X-ray photoelectron spectroscopic analysis Chidambaram D, Halada GP, Clayton CR
296 - 306	The chemisorption of organophosphorus compounds at an Al(111) surface Davies PR, Newton NG
307 - 316	Structure and morphology of self-assembled 3-mercaptopropyltrimethoxysilane layers on silicon oxide Hu MH, Noda S, Okubo T, Yamaguchi Y, Komiyama H
317 - 326	Determination of pyrrole-aniline copolymer compositions by X-ray photoelectron spectroscopy Lim VWL, Kang ET, Neoh KG, Ma ZH, Tan KL
327 - 330	The fractal dimension of boron-doped diamond films Silva LLG, Ferreira NG, Dotto MER, Kleinke MU
331 - 338	The effect of postdeposition annealing on chemical bonding in amorphous carbon nitride films prepared by dc magnetron sputtering Jiang LD, Fitzgerald AG, Rose MJ
339 - 348	Influence of structure development on atomic layer deposition of TiO2 thin films Aarik J, Karlis J, Mandar H, Uustare T, Sammelselg V