255 - 258 |
Study of well adherent DLC film deposited on piezoelectric LiTaO3 substrate Tian J, Zhang Q, Zhou Q, Yoon SF, Ahn J, Wang SG, Li JQ, Yang DJ |
259 - 261 |
The critical layer number of epitaxially grown Cu and Ni films with strained structure Li JC, Liu W, Jiang Q |
262 - 267 |
Metal-based transparent heat mirror for ultraviolet curing applications Wang ZG, Chen QL, Cai X |
268 - 272 |
Wirelike growth of self-assembled hafnium silicides: oxide mediated epitaxy Lee JH |
273 - 278 |
Calculation of the surface binding energy for ion sputtered particles Kudriavtsev Y, Villegas A, Godines A, Asomoza R |
279 - 284 |
Magnetic domain structure in small diameter magnetic nanowire arrays Qin DH, Zhang HL, Xu CL, Xu T, Li HL |
285 - 291 |
Synthesis and characterization of nanostructured titania film for photocatalysis Zhao L, Yu Y, Song LX, Hu XF, Larbot A |
292 - 301 |
Preparation and characterization of alkyl sulfate and alkylbenzene sulfonate surfactants/TiO2 hybrid thin films by the liquid phase deposition (LPD) method Li L, Mizuhata M, Deki S |
302 - 310 |
Evaluation of phase, composition, microstructure and properties in TiC/a-C : H thin films deposited by magnetron sputtering Gulbinski W, Mathur S, Shen H, Suszko T, Gilewicz A, Warcholinski B |
311 - 319 |
Influence of atomic-scale irregularities in fractal analysis of electrode surfaces Eftekhari A, Kazemzad M, Keyanpour-Rad M |
320 - 326 |
Preparation and modification of well-aligned CNTs grown on AAO template Xu JM, Zhang XB, Fei C, Li T, Li Y, Tao XY, Wang YW, Wu XJ |
327 - 334 |
AIN thin films fabricated by ultra-high vacuum electron-beam evaporation with ammonia for silicon-on-insulator application Zhu M, Chen P, Fu RKY, Liu WL, Lin CL, Chu PK |
335 - 341 |
Fabrication of contact electrodes in Si for nanoelectronic devices using ion implantation Kim JC, Kline JS, Tucker JR |
342 - 352 |
Corrosion behavior of tin ions implanted zirconium in 1N H2SO4 Peng DQ, Bai XD, Chen XW, Zhou QG, Liu XY, Yu RH, Deng PY |
353 - 366 |
Monte Carlo simulations of controlled rate thermal analysis spectra -The influence of surface energetic heterogeneity and lateral interactions between adsorbed molecules Panczyk T, Villieras F |
367 - 375 |
Chemical alteration of poly(vinyl fluoride) Tedlar by hyperthermal atomic oxygen Hoflund GB, Everett ML |
376 - 380 |
A modified Stillinger-Weber empirical potential for boron nitride Moon WH, Hwang HJ |
381 - 386 |
Heat affected zone in aluminum single crystals submitted to femtosecond laser irradiations Valette S, Audouard E, Le Harzic R, Huot N, Laporte P, Fortunier R |
387 - 393 |
Some anomalies in the regularities of the SER spectra of benzene and hexafluorobenzene Polubotko AM |
394 - 397 |
Room temperature near-field photoluminescence of zinc-blend and wurtzite ZnO structures Lee GH, Kawazoe T, Ohtsu M |
398 - 409 |
Electrochemical synthesis of polythiophene on nickel coated mild steel and corrosion performance Tuken T, Yazici B, Erbil M |
410 - 423 |
Hydrophobic recovery of UV/ozone treated poly(dimethylsiloxane): adhesion studies by contact mechanics and mechanism of surface modification Olah A, Hillborg H, Vancso GJ |
424 - 431 |
Bistable mean-field kinetics of CO oxidation on Pt with oxide formation Carlsson PA, Zhdanov VP, Kasemo B |
432 - 436 |
Influence of heat treatment on field emission characteristics of boron nitride thin films Li WQ, Gu GR, Li YG, He Z, Feng W, Liu LH, Zhao CH, Zhao YN |
437 - 444 |
Study on electron emission suppression characteristic of molybdenum grid coated with Hf film by ion beam assisted deposition Jiang J, Jiang BY, Ren C, Feng T, Wang X, Liu XH, Zou SC |
445 - 450 |
Direct measurement of sidewall roughness of polymeric optical waveguides Pani SK, Wong CC, Sudharsanam K, Lim V |
451 - 457 |
Epitaxial growth of well-ordered ultra-thin Al2O3 film on NiA1 (110) by a single-step oxidation Lay TT, Yoshitake M, Song W |
458 - 463 |
A novel gate structure in large diagonal size printable CNT-FED Wang QL, Lei W, Zhang XB, Wang BP, Liu M, Zhou XD, Di YS, Ma XY |
464 - 469 |
Photoemission study of interfacial reactions during annealing of ultrathin yttrium on SiO2/Si(100) 0 0) Wang ZM, Wu JX, Fang Q, Zhang JY |
470 - 480 |
Characterization of thin films on the nanometer scale by Auger electron spectroscopy and X-ray photoelectron spectroscopy Powell CJ, Jablonski A, Werner WSM, Smekal W |
481 - 489 |
Effect of series resistance on the performance of silicon Schottky diode in the presence of tin oxide layer Tugluoglu N, Karadeniz S, Altindal S |