Electrochemical and Solid State Letters

Electrochemical and Solid State Letters, Vol.9, No.1 Entire volume, number list

ISSN: 1099-0062 (Print)

In this Issue (33 articles)

A1 - A4	The electrochemical characterization of lithium bis( oxalato) borate synthesized by a novel method Yu BT, Qiu WH, Li FS, Xu GX
A5 - A8	Carbon nanotubes grown directly on Ti electrodes and enhancement of their electrochemical properties by nitric acid treatment Fang WC, Huang JH, Chen LC, Su YO, Chen KH, Sun CL
A9 - A12	Cr poisoning suppression in solid oxide fuel cells using LaNi(Fe)O-3 electrodes Komatsu T, Arai H, Chiba R, Nozawa K, Arakawa M, Sato K
B1 - B4	Evaluation of the performance of TiO2-CeO2 bilayer coatings as photoanodes for corrosion protection of copper Subasri R, Deshpande S, Seal S, Shinohara T
B5 - B7	Food preservatives serving as nonselective metal and alloy corrosion inhibitors Ein-Eli Y, Abelev E, Starosvetsky D
B8 - B10	STM observation of grain ripening during air exposure of the passive film formed on iron Deng HH, Nanjo H, Ishikawa I, Laycock NJ, Atkin J, Hendy SC
C1 - C4	Cathodic electrodeposition of CdO thin films from oxygenated aqueous solutions Seshadri A, de Tacconi NR, Chenthamarakshan CR, Rajeshwar K
C5 - C8	Molecular assembly engineering of self-doped polyaniline film for application in electrochromic devices Yang CH, Chih YK, Wu WC, Chen CH
C9 - C11	Synthesis of chiral polyaniline films via chemical vapor phase polymerization Chen J, Winther-Jensen B, Pornputtkul Y, West K, Kane-Maquire L, Wallace GG
D1 - D4	Etch trends in electrochemical machining with ultrashort voltage pulses - Predictions from theory and simulation Kenney JA, Hwang GS
E1 - E3	In situ observation of reversible oxygen absorption/release of ceria-zirconia solid solution with Pt particles by TEM and EELS Arai S, Muto S, Sasaki T, Ukyo Y, Kuroda K, Saka H
F1 - F4	Differential surface-charge-induced damage of dielectrics and leakage kinetics during plasma processing Abatchev MK, Murali SK
F5 - F7	Transformation of the crystalline structure of an ALD TiO2 film on a Ru electrode by O-3 pretreatment Kim SK, Hwang GW, Kim WD, Hwang CS
F8 - F11	Electrical properties of aluminum silicate films grown by plasma enhanced atomic layer deposition Lim JW, Yun SJ, Lee JH
G1 - G3	Oxygen-vacancies-related room-temperature ferromagnetism in polycrystalline bulk co-doped TiO2 Kong LG, Kang JF, Wang Y, Sun L, Liu LF, Liu XY, Zhang X, Han RQ
G4 - G6	Improved gate-edge profile of metal/high-k gate stack using an NH3 ashing process in gate-first CMOSFETs Song SC, Zhang Z, Huffman C, Bae SH, Sim JH, Lee BH
G7 - G9	Electrical characterization of 256 Mbit DRAM with carbon-implanted drain Pan TM, Yang CC
H1 - H3	Efficient electron injection in organic light emitting diodes with Al-Mg alloy cathode Kim SY, Kim WK, Kim KY, Tak YH, Lee JL
L1 - L1	Nanosize effect on the oxide ionic conductivity of lanthanum germanite thin films (vol 8, pg A607, 2005) Yan J, Matsumoto H, Ishihara T
A13 - A15	Novel Pt-Ru-Ni/C catalysts for methanol electro-oxidation in acid medium Wang ZB, Yin GP, Shi PF, Sun YC
A16 - A18	Atypical Li1.1V3O8 prepared by a novel synthesis route Deptula A, Dubarry M, Noret A, Gaubicher J, Olczak T, Lada W, Guyomard D
A19 - A23	Washing effect of a LiNi0.83Co0.15Al0.02O2 cathode in water Kim J, Hong YS, Ryu KS, Kim MG, Cho J
A24 - A26	Overcharge protection for high voltage lithium cells using two electroactive polymers Chen GY, Richardson TJ
A27 - A30	Preparation and characterization of Li-1.05[Ni0.35Co025Mn0.4]O-2 as a cathode material for rechargeable lithium cells Son JT, Cairns EJ
A31 - A33	A solid oxide fuel cell running on H2S/CH4 fuel mixtures Cheng Z, Zha SW, Aguilar L, Wang D, Winnick J, Liu ML
A34 - A38	Effect of capping agents in tin nanoparticles on electrochemical cycling Kwon Y, Kim MG, Kim Y, Lee Y, Cho JP
C12 - C14	Highly oriented VO2 thin films prepared by sol-gel deposition Chae BG, Kim HT, Yun SJ, Kim BJ, Lee YW, Youn DH, Kang KY
C15 - C18	Conformality of Pb(Zr, Ti)O-3 films deposited on trench structures having submicrometer diameter and various aspect ratios Nagai A, Minamidate J, Asano G, Choi CJ, Cho CR, Park Y, Funakubo H
C19 - C23	Electrochemically deposited ruthenium seed layer followed by copper electrochemical plating Kim YS, Kim HI, Dar MA, Seo HK, Kim GS, Ansari SG, Senkevich JJ, Shin HS
G10 - G12	H-2/D-2 isotopic effect on negative bias temperature instabilities in SiOx/HfSiON/TaN gate stacks Houssa M, Aoulaiche M, De Gendt S, Groeseneken G, Heyns MM, Stesmans A
G13 - G16	Study on pressure-independent Cu removal in Cu abrasive-free polishing Fang JY, Huang PW, Tsai MS, Dai BT, Wu YS, Feng MS
G17 - G18	Electrochromic properties of sputtered Ni oxide thin films in neutral KCl electrolytes Abe Y, Lee SH, Zayim EO, Tracy CE, Pitts JR, Deb SK
G19 - G21	Ultrashallow p(+)/n junction prepared by low energy BF3 plasma doping and KrF excimer laser annealing Lee D, Baek S, Heo S, Cho C, Buh G, Park T, Shin Y, Hwang H