Thin Solid Films, Vol.519, No.2, 766-769, 2010
Cathodic arc co-deposition of highly oriented hexagonal Ti and Ti2AlC MAX phase thin films
Ti2AlC belongs to a family of ternary nanolammate alloys known as the MAX phases which exhibit a unique combination of metallic and ceramic properties Here we report pulsed cathodic arc deposition of c axis normal oriented Ti2AlC thin films on alpha Al2O3 (001) single crystal substrates heated to 900 C without an intentionally pre-deposited seed layer Oriented hexagonal Ti is observed in some films and an in-plane epitaxial relationship between the alpha-Al2O3 (001) substrate the hexagonal Ti and Ti2AlC MAX phase is observed We observe formation of the Ti2AlC phase in all films despite variations in elemental composition The electrical resistivity of our films was in the range 0 48-0 67 mu Omega m higher than other values found for Ti2AlC in the literature (c) 2010 Elsevier B V All rights reserved
Keywords:Pulsed cathodic arc;X ray diffraction;Physical vapor deposition;Thin film;Epitaxy;MAX phase;Titanium aluminum carbide