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Journal of the Korean Industrial and Engineering Chemistry, Vol.1, No.1, 1-10, October, 1990
Polysilane 유도체의 합성과 그 응용
Preparation and Application of Polysilane Derivatives
초록
용매에 가용성이고 또한 성형이 가능한 각종polysilane유도체가 합성되면서 1980년대 이래 새로운 소재로서 많은 관심을 끌게 되었다. 저분자량 oligomer, 고리화합물, 고분자량의 polysilane 유도체를 합성하는 방법을 소개하고 Si-Si 결합과 또한 Si원자에 치환된 치환기의 종류에 따른 광화학반응 특성을 알아본다. 또한 polysilane은 탄화규소섬유의 precursor로, microelectronics에 있어서 photoresist로, photoconductor로, 그리고 free radical 중합반응에서 photoinitiator로 이용될 수 있는데 이들의 이용에 대한 최근의 연구결과들을 요약하여 소개한다.
Polysilane derivatives are attracting considerable attention as a new class of material since 1980. The preparation methods of low molecular weight, cyclic, and high molecular weight polysilane derivatives are described, and also photochemistry characteristics for silicon - silicon single bond and for the nature of the substituent on silicon backbone are discussed. Polysilanes may be used as a precursors to silicon carbide fiber, as photoresist in microelectronics, as photoconductor, and as photoinitatior for free radical polymerization.
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