By using solution coating technique, BiFeO3 thin films with and without Bi2O3 seed layer were prepared on Pt/Ti/SiO2/Si substrate. It is found that the Bi2O3 seed layer can decrease greatly the crystallization temperature of films and can induce {110} and {(1)over bar>10} textures in the films. The leakage current density of BiFeO3 film with the seed layer is roughly about 1/100 of that of the film without seed layer at 100 kV/cm electric field. The conduction mechanism is found to be Ohmic in the low electric field region for both the BiFeO3 films. In high electric field region, the conduction mechanism for BiFeO3 film without the seed layer satisfies the trap-filled-limited conduction model, while that for BiFeO3 film with the seed layer is corresponds to the conduction model of modified interface limited Schottky emission. Moreover, the dielectric property of BiFeO3 thin film can be improved greatly by the Bi2O3 seed layer. (C) 2013 Elsevier B. V. All rights reserved.