Materials Science Forum, Vol.483, 425-428, 2005
Evaluation of on-state resistance and boron-related levels in n-type 4H-SiC
Specific on-resistance R(on). estimated from current density-voltage characteristics of Schottky diodes on thick layers exhibits variations from tens of m Omega.cm(2) to tens of Omega.cm(2) for different doping levels. In order to understand the occurrence of high on-state resistance, Schottky barrier heights were first estimated for both forward and reverse bias with the application of thermionic emission theory and were in agreement with a literature reported values. Decrease in mobility with the temperature was observed and its dependencies of T(-13) and T(-2.0) for moderately doped and low doped samples respectively were estimated. From deep level measurements by Minority Carrier Transient Spectroscopy, an influence of shallow boron related levels and D-center on dependence of on-state resistance was observed, being more pronounced in low doped samples. Similar tendency was observed in depth profiling of R(on). This suggests a major role of boron in a compensation mechanism thus resulting in high R(on).
Keywords:on-state resistance;I-V;C-V;MCTS;sublimation;high-speed epitaxy;deep levels;boron;compensation