화학공학소재연구정보센터
Korean Journal of Materials Research, Vol.18, No.2, 98-102, February, 2008
광화학증착법에 의한 직접패턴 PZT 박막의 제조 및 특성
Fabrication and Characterization of Direct-Patternable PZT Film Prepared by Photochemical Metal-Organic Deposition
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The ferroelectric properties of UV irradiated and non-irradiated PZT films prepared via photochemical metal-organic deposition using photosensitive precursors were characterized. Fourier transform infrared spectroscopy showed that complete removal of organic groups was possible through UV exposure of the spin-coated PZT precursor films at room temperature. The measured remnant polarization values of UVirradiated and non-irradiated PZT films after annealing at 650oC were 29 and 23 μC/cm2, respectively. The UV irradiation was found to be effective for the enhancement of the <111> growth orientation and ferroelectric property of PZT film and in the direct patterning in the fabrication of micro-patterned systems without dry etching.
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