화학공학소재연구정보센터
홈 로그인 로그아웃 연락처 사이트맵
Korean Journal of Materials Research, Vol.16, No.4, 218-224, April, 2006
DOI10.3740/MRSK.2006.16.4.218  Export Citation
RF 스퍼터링으로 증착된 하이드록시아파타이트 박막의 열처리 특성
The Heat Treatment Characteristics of Hydroxyapatite Thin Films Deposited by RF Sputtering
정찬회, 이준희†, 신윤학1, 김명한1, 최석환2, 김승언3
  • 동아대학교 신소재공학과
  • 1충북대학교 재료공학과
  • 2한국생산기술연구원
  • 3한국기계연구원
Chan-Hoi Jung, Jun-Hee Lee†, Youn-Hak Shin1, Myung-Han Kim1, Sock-Hwan Choi2, and Seung-Eon Kim3
  • Dept. of Materials Science and Engineering, Donga University, Korea
  • 1Dept. of Materials Engineering, Chungbuk National University, Korea
  • 2Korea Institute Of Industial Technology, Korea
  • 3Korea Institute Of Machiery and Materials, Korea
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RF sputtering process was applied to produce thin hydroxyapatite(HAp) films on Ti-6Al-4V alloy substrates. The effects of different heat treatment conditions on the hardness between HAp thin films and Ti-6Al-4V alloy substrates were studied. Before deposition, the Ti-6Al-4V alloy substrates were heat treated for 1h at 850 ? Cunder3.0×10 ?3 torr , and after deposition, the HAp thin films were heat treated for 1h at 400 ? C,600 ? Cand800 ? C under the atmosphere, and analyzed FESEM-EDX, FTIR, XRD, nano-indentor, micro-vickers hardness, respectively. Experimental results represented that the surface defects of thin films decreased by relaxation of internal stress and control of substrate structure followed by heat treatment of substrates before the deposition, and the HAp thin films on the heat-treated substrates had higher hardness than none heattreated substrates before the deposition, and the hardness properties of HAp thin films and Ti-6Al-4V alloy substrates appeared independent behavior, and the hardness of HAp thin films decreased by formation of VTiO 3 (OH),θ?Al 0.32 V 2 O 5 ,Al 0.33 V 2 O 5 .
Keywords:Hydroxyapatite;Ti-6Al-4V Alloy;RF Sputtering;Heat Treatment
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