호모폴리머 그래프팅을 통한 PS-b-PDMS 블록공중합체의 형상제어

최영중; 박태완; 박운익; Young Joong Choi; Tea Wan Park; Woon Ik Park

Polymer(Korea), Vol.42, No.6, 1110-1114, November, 2018

DOI10.7317/pk.2018.42.6.1110 Export Citation

호모폴리머 그래프팅을 통한 PS-b-PDMS 블록공중합체의 형상제어

Controlled Morphology Transition of PS-b-PDMS Block Copolymer via PS Homopolymer Grafting

최영중, 박태완, 박운익^†

한국세라믹기술원 전자융합소재본부

Young Joong Choi, Tea Wan Park, and Woon Ik Park^†

Electronic Convergence Materials Division, Korea Institute of Ceramic Engineering & Technology (KICET), 101 Soho-ro, Jinju 52851, Korea

E-mail:

초록

차세대 나노리소그래피 공정 중 하나인 블록공중합체 유도자기조립을 전자 소자 제작 공정에 응용하기 위해서는 높은 상호인력계수를 가지는 블록공중합체의 자기조립 속도 및 형상을 제어하는 것이 매우 중요하다. 본 연구에서는, 실린더 모폴로지를 형성하는 PS-b-PDMS 블록공중합체에 있어서, 자기조립 시의 형상 변화를 제어하기 위하여, 유도자기조립용 가이딩 템플릿의 표면을 다양한 분자량을 갖는 PS-OH의 고분자를 이용하여 표면을 개질하였다. 특히, 자기조립에 사용된 블록공중합체와 비슷한 분자량을 가지는 고분자 브러쉬를 사용하여, 열역학적으로 안정된 고정렬의 나노구조물을 얻을 수 있었다. 또한 PS-OH 브러쉬의 두께를 조절하여 PS-b-PDMS의 형상변화를 제어하였으며, 최적의 고분자 브러쉬 조건에서 열보조 용매어닐링 방법을 이용하여, 20 nm 이하의 선폭을 가지는 고정렬 라인 패턴을 단시간(약 15분) 내에 얻을 수 있었다. 이 연구 결과는, 높은 상호인력계수를 가지는 블록공중합체 자기조립 기반의 차세대 리소그래피 기술에 새로운 가이드라인을 제시할 것으로 기대된다.

To control the self-assembly kinetics and morphology of high-χ block copolymers (BCPs) is important in order to apply BCPs self-assembly to next-generation nanofabrication. We employed hydroxyl-terminated polystyrene (PS-OH) homopolymer brushes with various molecular weights (MWs) for surface modification of Si guiding template to control the morphological transition of cylinder forming poly(styrene-b-dimethylsiloxane) (PS-b-PDMS) BCP. When PS brush with similar MW to PS-b-PDMS was used, highly ordered nanostructures were easily obtained. Furthermore, we controlled the self-assembled BCP morphology by manipulating the thickness of the PS-OH brush, and we successfully obtained well-aligned sub-20 nm line pattern in a short annealing time (~15 min) by means of binary solvent vapor annealing at optimum PS-OH brush condition. These results are expected to provide a new guideline for next-generation lithography technology based on high-χ BCPs.

Keywords:block copolymer;directed self-assembly;surface modification;morphology transition

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[2] Bates FS, Fredrickson GH, Annu. Rev. Phys. Chem., 41, 525 (1990)

[3] Black CT, Ruiz R, Breyta G, Cheng JY, Colburn ME, Guarini KW, Kim HC, Zhang Y, IBM J. Res. Dev., 51, 605 (2007)

[4] Darling SB, Prog. Polym. Sci, 32, 1152 (2007)

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[6] Ruiz R, Kang HM, Detcheverry FA, Dobisz E, Kercher DS, Albrecht TR, de Pablo JJ, Nealey PF, Science, 321, 936 (2008)

[7] Tavakkoli KGA, Gotrik KW, Hannon AF, Alexander-Katz A, Ross CA, Berggren KK, Science, 336(6086), 1294 (2012)

[8] Jeong JW, Park WI, Kim MJ, Ross CA, Jung YS, Nano Lett., 11, 4095 (2011)

[9] Lodge TP, Dalvi MC, Phys. Rev. Lett., 75, 657 (1995)

[10] Park WI, Kim K, Jang HI, Jeong JW, Kim JM, Choi J, Park JH, Jung YS, Small, 8, 3762 (2012)

[11] Park WI, Kim JM, Jeong JW, Jung YS, ACS Nano, 8, 10009 (2014)

[12] Kim SH, Misner MJ, Xu T, Kimura M, Russell TP, Adv. Mater., 16(3), 226 (2004)

[13] Harrison C, Chaikin PM, Huse DA, Register RA, Adamson DH, Daniel A, Huang E, Mansky P, Russell TP, Hawker CJ, Egolf DA, Melnikov IV, Bodenschatz E, Macromol, 33, 857 (2000)

[14] Jeong SJ, Xia G, Kim BH, Shin DO, Kwon SH, Kang SW, Kim SO, Adv. Mater., 20, 898 (2008)

[15] Gu W, Hong SW, Russell TP, ACS Nano, 6, 10250 (2012)

[16] Park WI, Choi YJ, Yuk JM, Seo HK, Kim KH, Polymer, 50, 221 (2018)

[17] de Gennes PG, Macromol, 13, 1069 (1980)

[18] de Gennes PG, Scaling Concepts in Polymer Physics, Cornell University Press, New York, 1981.