Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology A, Vol.12, No.6, 2999-3011, 1994 DOI10.1116/1.578928 Export Citation Spontaneous Etching of Si(100) by Xef2 - Test-Case for a New Beam Surface Experiment Vugts MJ, Joosten GJ, Vanoosterum A, Senhorst HA, Beijerinck HC Keywords:SILICON SURFACES;FLUORINE;SI(111);PRODUCTS;SPECTROSCOPY;ADSORPTION;ATOMS;SI Please enable JavaScript to view the comments powered by Disqus.
