Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology A, Vol.13, No.2, 335-342, 1995 Export Citation Dry-Etching of Titanium Nitride Thin-Films in CF4-O-2 Plasmas Fracassi F, Dagostino R, Lamendola R, Mangieri I Keywords:RAY PHOTOELECTRON-SPECTROSCOPY;RUTHERFORD BACKSCATTERING;ELECTRON-SPECTROSCOPY;TIN;SURFACE;SPECTRA Please enable JavaScript to view the comments powered by Disqus.
