Journal of Vacuum Science & Technology B, Vol.12, No.6, 3841-3845, 1994
Wavelength Dependence of the Resist Sidewall Angle in Extreme-Ultraviolet Lithography
Wood OR,
Bjorkholm JE,
Fetter L,
Himel MD,
Tennant DM,
Macdowell AA,
Lafontaine B,
Griffith JE,
Taylor GN,
Waskiewicz WK,
Windt DL,
Kortright JB,
Gullikson EK,
Nguyen K
