Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology B, Vol.12, No.6, 3863-3867, 1994 DOI10.1116/1.587455 Export Citation Effect of Photo Acid Generator Concentration on the Process Latitude of a Chemically Amplified Resist Petrillo KE, Pomerene AT, Babich ED, Seeger DE, Hofer D, Breyta G, Ito H Please enable JavaScript to view the comments powered by Disqus.
