Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology B, Vol.12, No.6, 3914-3918, 1994 DOI10.1116/1.587574 Export Citation Quarter-Micron Lithography with a Wet-Silylated and Dry-Developed Commercial Photoresist Gogolides E, Tzevelekis D, Tsoi E, Hatzakis M, Goethals AM, Baik KH, Vanroey F Keywords:POLYMERS Please enable JavaScript to view the comments powered by Disqus.
