Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology B, Vol.12, No.6, 3909-3913, 1994 DOI10.1116/1.587573 Export Citation Plasma-Polymerized All-Dry Resist Process for 0.25 Mu-M Photolithography Joubert O, Weidman T, Joshi A, Cirelli R, Stein S, Lee JT, Vaidya S Please enable JavaScript to view the comments powered by Disqus.
