Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology B, Vol.12, No.6, 4044-4050, 1994 DOI10.1116/1.587427 Export Citation Wavelength Dependence of Exposure Window and Resist Profile in X-Ray-Lithography Guo JZ, Celler GK, Maldonado JR, Hector SD Please enable JavaScript to view the comments powered by Disqus.
