Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology B, Vol.12, No.6, 4051-4054, 1994 DOI10.1116/1.587428 Export Citation High-Performance Self-Aligned Sub-100 nm Metal-Oxide-Semiconductor Field-Effect Transistors Using X-Ray-Lithography Yang IY, Hu H, Su LT, Wong VV, Burkhardt M, Moon EE, Carter JM, Antoniadis DA, Smith HI, Rhee KW, Chu W Keywords:FABRICATION;TECHNOLOGY;SYSTEM;MASKS Please enable JavaScript to view the comments powered by Disqus.
