Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology B, Vol.13, No.1, 40-42, 1995 DOI10.1116/1.587982 Export Citation Smooth Reactive Ion Etching of GaAs Using a Hydrogen Plasma Pretreatment Choquette KD, Shul RJ, Howard AJ, Rieger DJ, Freund RS, Wetzel RC Please enable JavaScript to view the comments powered by Disqus.
