Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology B, Vol.13, No.2, 247-252, 1995 DOI10.1116/1.588359 Export Citation Dry Photochemical Selective Etching of InGaAs/InAlAs in HBr Gas-Using a 172-nm Excimer Lamp Habibi S, Totsuka M, Tanaka J, Kinoshita T, Matsumoto S, Iida S Keywords:GATE RECESS;INP;MODFETS;BARRIER Please enable JavaScript to view the comments powered by Disqus.
