Microstructure of the titanium hydride (deuteride) films prepared by rf reactive sputtering with Ar and H-2 (or D-2) gases were examined by X-ray diffraction measurements, scanning electron microscopy, Rutherford backscattering spectrometry and elastic recoil detection analysis. In addition, their optical measurements were also carried out in visible and infra-red regions. It was found that the hcp Ti structure (alpha-TiHx) was mainly formed at high rf power. With decreasing rf power, however, the fee CaF2 structure (delta-TiHx) was obtained. The films have a smooth surface at a short time of deposition for 1-10 min, and these films are used for optical measurements. The films show wide absorption over visible and infra-red regional although the films include a large amount of O atoms, which may suggest the presence of the amorphous titanium oxide phase.