페로센으로부터 증착된 Fe-C:H 막 특성 분석

김경수; 이우걸; 윤용수; 정일현

Applied Chemistry, Vol.7, No.2, 511-514, October, 2003

The Characteristic Analysis of Fe-C:H Films Deposited from Ferrocene

Fe-C:H films were deposited in a RF plasma with ferrocene (Fe(C₅H₅)₂). The deposited Fe-C:H films consisted of C-H_n, C=C, and C-CH_n. The deposition rate linearly increased with the flow ratc of hydrogen. In all conditions of experiments, the band gap of Fe-C:H film was about 3.8 eV.