Behaviors of electrons and fluorocarbon radicals were investigated in 60 MHz capacitively coupled plasma employing mixture gases of C-C4F8, Ar, and N-2. Optical emission spectroscopy was applied to measurements of the rotational temperatures of CF radical and N-2 molecule, and infrared diode laser absorption spectroscopy was applied to that of the densities of CF and CF2 radicals. The electron density was decreased from 7.3 x 10(10) to 3.0 x 10(10) cm(-3), and electron temperature was increased from 3.0 to 5.1 eV with increasing N-2 flow rate. The addition of N-2 to Ar/C4F8 plasma decreased the density of CF radical dominantly as compared with CF2 radical. The rotational temperatures of CF radical were estimated from the (1-2) band of B (2)Delta-X (II)-I-2 electronic transition of CF radicals. It was found that the rotational temperatures of CF radicals were increased with increasing N-2 flow rate. The temperatures of radical indicated the different behaviors from the temperatures of N-2 molecule. The rotational temperature of CF radical has a good relation with the electron temperature. (c) 2006 American Vacuum Society.