Nanoscale surface modification of silicate glasses was examined by applying nanoimprint technique using a nanostriped NiO thin film mold. The mold had the pattern composed of regularly arranged straight nanogrooves, which was formed by high-temperature annealing of the Li-doped NiO epitaxial thin film deposited on the atomically stepped sapphire (alpha-Al2O3 single crystal) substrate. The glass imprint was proceeded through the simple steps of heating (similar to 600 degrees C), pressing (similar to 1 kPa) and then cooling in air. The nanoimprinted glass surface transferred reversely from the mold exhibited the multi nanowire array having an interval of similar to 80 nm, wire width of similar to 70 nm, and wire height of similar to 20 nm. (c) 2006 Elsevier B.V. All rights reserved.