Metallic thin films of TTF[Ni(dmit)(2)](2) by electrodeposition on (001)-oriented silicon substrates

de Caro D; Fraxedas J; Faulmann C; Malfant I; Milon J; Lamere JF; Colliere V; Valade L

Advanced Materials, Vol.16, No.9-10, 835-835, 2004

de Caro D, Fraxedas J, Faulmann C, Malfant I, Milon J, Lamere JF, Colliere V, Valade L

Thin films of organic metals generally exhibit activated conductivity caused by intergrain conduction barriers. One of the few examples of thin films showing truly metallic character is TTF[Ni(dmit)(2)](2). Films electrodeposited on silicon substrates remain metallic down to 12 K in spite of their polycrystalline morphology (see Figure).