Polymer(Korea), Vol.16, No.1, 94-104, January, 1992
유기실리콘화합물의 플라즈마 중합에 관한 연구: 1. 플라즈마 중합막의 화학구조
Plasma Polymerizatin of Organosilicon Compounds : 1. Chemical Structure of Plasma Polymer
초록
테트라메칠실란(TMS), 헥사메칠디실라잔(HMDSIZ), 헥사메칠디실록산(HMDSIO)의 플라즈마 중합에 의한 유기실리콘 박막의 형성에 있어 중합의 에너지 조건 (W/Fm)이 생성박막의 화학구조에 미치는 영향을 FTIR과 XPS 분석에 의해 상세히 검토하였다. 생성박막의 화학구조적 특성은 107 J/㎏-l09 J/㎏ 범위의 W/Fm값 조절에 의해 체계적이고 대폭적인 변화를 보였으며 이러한 화학구조의 변화는 플라즈마 중합의 활성화 성장기구에 의해 설명되었다.
Thin organosilicon films were obtained by the plasma polymerization of tetramethylsilane(TMS), hexamethyldisilazane(HMDSIZ), and hexamethyldisiloxane(HMDSIO). The effect of input energy level (W/Fm) on the chemical structure of the plasma polymer was investigated by using FTIR and XPS measurements. The structural characteristics of the plasma polymer were significantly altered by the value of W/Fm (over the range of 107 J/㎏ to l09 J/㎏) . The unique and notable influence of W/Fm on the chemical structure was interpreted in relation to the activation growth mechanism of the plasma polymerization.
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