We present a number of important characteristics of laser techniques for preparation of nanostructured thin films with foci on laser ablation (LA) and laser-assisted chemical vapor decomposition (LCVD). Size-related features and structures of the deposited layers are associated with process parameters. Whenever possible, the performance of the deposits is compared to that of films prepared by other methods (e.g., physical vapor synthesis such as gas deposition, sputtering, etc.). The LA and LCVD methods allow a wide variety of materials to be prepared. A number of promising applications emerge when one combines this versatility with the potential for making certain types of nanostructured layers. These possibilities are also discussed. (c) 2007 Elsevier B.V. All rights reserved.