화학공학소재연구정보센터
홈 로그인 로그아웃 연락처 사이트맵
Journal of Industrial and Engineering Chemistry, Vol.16, No.2, 193-199, March, 2010
DOI10.1016/j.jiec.2009.10.007  Export Citation
Measurement of the hydroxyl radical formation from H2O2, NO3-, and Fe(III) using a continuous flow injection analysis
Bum Gun Kwon†, and Jung-Hwan Kwon1
  • Department of Environmental Science and Engineering, Gwangju Institute of Science and Technology (GIST), 1 Oryong-dong Buk-gu, Kwangju 500-712, Republic of Korea
  • 1Department of Environmental Engineering, Ajou University, Woncheon-dong, Yeongtong-gu, Suwon 443-742, Republic of Korea
E-mail:
Production of hydroxyl radical (·OH) is of significant concern in engineered and natural environment. A simple in situ method was developed to measure ·OH formation in UV/H2O2, UV/Fe(III), and UV/NO3- systems using trapping of ·OH by benzoic acid (BA) and measuring fluorescence signals from hydroxylated products of BA. Method development included characterization of ·OH trapping mechanism and measurement of quantum yields (φ.OH) for ·OH. The distribution of OHBA isomers was in the order of o-OHBA > p-OHBA > m-OHBA, although it changed with the H2O2 concentration and light intensity. This supports that ·OH attacks dominantly on the benzene rings. The quantum yields for ·OH formation in the UV/H2O2 process were 1.02 and 0.59 at 254 and 313 nm, which were in good agreement with the literature values, confirming that themethod is suitable for the measurement of ·OH production from UV/H2O2 processes. Using the continuous flow method developed, quantum yields for ·OH in UV/H2O2, UV/Fe(III), and UV/NO3- systems were measured varying the initial concentration of ·OH precursors. The φ.OH values increased with increasing concentrations of H2O2, Fe(III), and NO3- and approached constant values as the concentration increased. The φ.OH values were 0.009 for H2O2 at 365 nm, showing that ·OH production is not negligible at such high wavelength.The φ.OH values during the photolysis of Fe(OH)2+ (pH 3.0) and Fe(OH)2+ (pH 6.0) at 254 nm were 0.34 and 0.037, respectively. The φ.OH values for NO3- approached a constant value of 0.045 at 254 nm at the initial concentration of 10 mM
Keywords:Quantum yield;ydroxybenzoic acid;Advanced oxidation process;Photo-degradation
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