| 학회 |
한국공업화학회 |
| 학술대회 |
2020년 가을 (10/28 ~ 10/30, 광주 김대중컨벤션센터(Kimdaejung Convention Center)) |
| 권호 |
24권 1호 |
| 발표분야 |
포스터-고분자 |
| 제목 |
The synthesis of photosensitive polyimide using various groups for application of semiconductors |
| 초록 |
Aromatic polyimide (PI) is a kind of excellent high performance polymer having thermal resistance and chemical resistance to radiation. Besides, since it has a relatively low dielectric constant and excellent mechanical properties, it is widely used in the space industry and semiconductor industry. Therefore a large molecular weight and flexibility has been required to improve physical properties of PI such as elongation rate. In this study, we synthesized DHBA having a hydroxyl functional group in the molecular structure and three kinds of aromatic ethylene diamines to improve flexibility of the PI film. And then polymerization was performed using DHBA and various kinds of synthesized monomers. After polymerization, Di-tert-butyl dicarbonate, 2-Nitrobenzyl bromide was substituted to the hydroxyl group of the polymer to synthesize photosensitive polyimide . The structure of the polymerized PSPI was analyzed by NMR and FT-IR. Thermal stability was also evaluated by TGA. |
| 저자 |
송광식, 김영랑, 김영훈, 박성만, 허윤정, 백정주, 장기철, 이효선, 배근열, 최경호, 신교직
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| 소속 |
한국생산기술(연) |
| 키워드 |
Polyimide; Photosensitive; PSPI
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| E-Mail |
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