| 학회 |
한국화학공학회 |
| 학술대회 |
2013년 봄 (04/24 ~ 04/26, 광주 김대중컨벤션센터) |
| 권호 |
19권 1호, p.814 |
| 발표분야 |
재료 |
| 제목 |
Plasma surface reaction modeling coupled with global bulk plasma model in fluorocarbon plasmas |
| 초록 |
As the critical dimension continues to decrease up to few tens nanometer, it is getting more critical issue to obtain the ideal etch profile in plasma processing due to the complexity of surface reaction mechanism. Unfortunately, plasma engineers still depends on their empiricism instead of the scientific approach. As an effort to address this issue, we present the predictable zero dimensional modeling approach that are coupled strongly with plasma surface reaction and bulk plasma modeling for fluorocarbon etch plasma. For this work, plasma diagnostic for bulk plasma and surface reaction in inductively coupled fluorocarbon plasma was performed by qudrapole mass spectrometry, langmuir probe, cut-off probe and silicon oxide etching. Based on these experimental data, key information such as rate coefficient and reaction paths for realistic bulk and surface plasma chemistries could be obtained in this work. Finally, we will demonstrate that this modeling approach is useful and effective route to predict the complex plasma phenomena in fluorocarbon plasma etching process. |
| 저자 |
이세아1, 천푸름1, 육영근1, 최광성1, 조덕균1, 유동훈1, 권득철2, 임연호1, 장원석2
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| 소속 |
1전북대, 2국가핵융합(연) |
| 키워드 |
Plasma surface kinetic studies; etch process; fluorocarbon plasma
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| E-Mail |
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| 원문파일 |
초록 보기 |
