| 학회 |
한국공업화학회 |
| 학술대회 |
2011년 가을 (11/02 ~ 11/04, 경원대학교) |
| 권호 |
15권 2호 |
| 발표분야 |
환경.에너지 |
| 제목 |
Abatement of CF4 and CHF3 using low-pressure plasmas generated by annular-shaped electrodes |
| 초록 |
A plasma abatement system operating at low pressures is set up with the aim of abating greenhouse gases emitted by the semiconductor industry. The reactor and electrodes all have a concentric annular shape, which allows them to be easily connected to pre-existing pipelines without any disturbance to the exhaust stream. The destruction and removal efficiencies for CF4 are measured by varying the O2/CF4 ratio and pressure. The influences of O2 and H2O additions on the byproducts of CHF3 abatement are investigated by analyzing the spectra measured using Fourier transform infrared spectroscopy. Based on the experimental results, an appropriate combination of driving scheme and reactant gas species is chosen for the efficient and economic abatement of the greenhouse gases emitted by the semiconductor industry. |
| 저자 |
허민1, 이재옥1, 유훈아2, 송영훈1
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| 소속 |
1한국기계(연), 2충남대 |
| 키워드 |
Low-pressure plasma abatement; annular-shaped electrode; greenhouse gases
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| E-Mail |
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