| 학회 |
한국공업화학회 |
| 학술대회 |
2011년 봄 (05/11 ~ 05/13, 제주국제컨벤션센터) |
| 권호 |
15권 1호 |
| 발표분야 |
나노 |
| 제목 |
Electron beam direct writing of polymer resists containing metal salts |
| 초록 |
In this study, electron beam direct writing of a thin polymer film containing metal salts is described to form the patterns of metal nanoparticles (NPs). Thin polymer films containing various amounts of metal salts on silicon wafers were patterned with electron beams using a SEM associated with a nanometer pattern generation system and subsequently pyrolyzed to produce the patterns of metal NPs. The resulting well-defined negative patterns were investigated by a FE-SEM with an energy dispersive X-ray spectrometer (EDX) before and after the pyrolysis. The results revealed that the resolved patterns of metal nanoparticles were formed successfully. |
| 저자 |
강동우1, 정찬희1, 황인태1, 최재학1, 노영창1, 문성용2
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| 소속 |
1한국원자력(연), 2한양대 |
| 키워드 |
Electron beam writing; polymer resist; metal nanoparticle; pattern
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| E-Mail |
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