| 학회 | 한국재료학회 |
| 학술대회 | 2006년 가을 (11/03 ~ 11/03, 수원대학교) |
| 권호 | 12권 2호 |
| 발표분야 | 반도체 재료 |
| 제목 | Effects of Organic Additives in Ceria Slurry on Enhanced Oxide-to-Nitride Removal Selectivity in Shallow Trench Isolation Chemical Mechanical Polishing |
| 초록 | Chemical mechanical polishing (CMP) is an essential process in contemporary Ultra-Large-Scale-Integrated circuits (ULSI) device fabrication. In Shallow Trench Isolation (STI) planarization, the residual thicknesses of the gap-filling oxide (SiO2) and mask nitride layers after CMP must be controlled to within a few ten nanometers. It is a great advantage for ceria (CeO2) slurry with organic surfactant and amines to offer high oxide-to-nitride (Si3N4) selectivity in the polishing removal rate; however, its mechanism has not been clear. We carried out a systematical experiment on polishing removal rate and removal selectivity of oxide and nitride films with varying the surfactant concentration and organic amines in ceria slurry. Ceria slurry was prepared with varying an organic surfactant and amines concentration of up to 3.0 wt%, respectively. The oxide removal rate decreased as the surfactant concentration was increased for all the slurries, but it’s slightly increase with increasing the organic amine concentration in slurry. Hence, the nitride removal rate decrease and saturated with increased the surfactant concentration. In addition, with additionally organic amines added in ceria slurry, the nitride removal rate is more decreased. The removal selectivity of oxide-to-nitride films was significantly enhanced with addition of organic amines after added surfactant in ceria slurry suspension. It supports our model based on the hydrodynamic movement of the abrasive near the film surface as well as the model with the selective adsorption and chemical reaction between film surface and organic additive in slurry. The Korea Ministry of Science and Technology supported this work through the National Research Laboratory (NRL) program. We thank SUMCO Corp. and Hynix Semiconductor Inc. for helping us with our experiments. |
| 저자 | Byeong-Seog LEE1, Hyun-Goo KANG1, Kyung-Woong PARK1, Ungyu PAIK2, Jea-Gun PARK3 |
| 소속 | 1Nano-SOI Process Lab. Hanyang Univ., 2Department of Ceramic Engineering, 3Hanyang Univ. |
| 키워드 | Organic Amine; STI-CMP; Cerai; Selectivity |
