| 초록 |
In this study, we synthesized branched polymers as ArF photoresist which have acid-cleavable crosslinkers via reversible addition-fragmentation chain transfer (RAFT) polymerization. Branched polymers containing degradative crosslinkers have improved contrast in a photolithographic process. Three methacrylate monomers for lithographic functionalities and cyanopropyldithionaphthalate (CPDN) as a chain transfer agent (CTA) were used. The polymers were connected by 2,5-dimethyl-2,5-hexanediol dimethacrylate (t-DMA) as acid-degradative linkers. The molecular weights and polydispersity indexes of the degraded chains are comparable to a RAFT-synthesized linear polymer prepared in the absence of any t-DMA brancher. The resulting polymers were investigated by 1H-NMR, GPC, and thermal analyses. |
