| 학회 |
한국고분자학회 |
| 학술대회 |
2007년 봄 (04/12 ~ 04/13, 제주 ICC) |
| 권호 |
32권 1호 |
| 발표분야 |
액정/LCD용 고분자 재료 |
| 제목 |
Silicon oxynitride gas barrier coatings on poly(ether sulfone) for flexible LCD substrates |
| 초록 |
Thin silicon oxynitride (SiOxNy) has been deposited for a gas barrier layer on the surface of poly(ether sulfone) film using plasma-enhanced chemical vapor deposition (PECVD) of a mixture of hexamethyldisiloxane (HMDSO) and ammonia. The chemical structure of the deposited layer varied from organic to inorganic structures depending on RF plasma input power applied to the reaction system. A silicon-based undercoat layer, which has an organic/inorganic hybrid structure, was used as an interfacial buffer layer between the organic PES and inorganic SiOxNy layer. With the help of the undercoat layer, the dense inorganic SiOxNy layer gave a superior gas barrier property of 0.2cm3/m2day at a critical coating thickness of ca. 20nm. In a highly stressed SiOxNy film, the effect of the undercoat layer was remarkable in preventing crack formation during bending tests. |
| 저자 |
곽순종1, 심준호2, 윤호규2, 김인선3, 나상현1
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| 소속 |
1한국과학기술(연), 2고려대, 3i-components (주) |
| 키워드 |
flexible display; plastic substrate; poly(ether sulfone); gas barrier; silicon oxynitride; undercoat
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| E-Mail |
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