| 초록 |
Well defined nanoporous templates with high aspect ratio are highly desirable for a variety of applications. In this study, we combined bilayer approach, well known in photolithography, with block copolymer (BCP) lithography. This system consists of a top Si-containing BCP layer which serves as etch resistant mask and an underlying SU-8 layer into which the nanopatterns from BCP are transferred by O2-RIE. The bilayer system using Si-containing BCP can greatly reduce the complexity of the process for nanopatterning that requires high aspect ratio structures. |
