| 학회 |
한국화학공학회 |
| 학술대회 |
2012년 봄 (04/25 ~ 04/27, 제주 ICC) |
| 권호 |
18권 1호, p.852 |
| 발표분야 |
이동현상 |
| 제목 |
GPU based 3D feature profile simulation for plasma etch process |
| 초록 |
Recently, one of the critical issues in the plasma etching processes of the nanosize devices is to achieve ultra-high deep contact hole without abnormal behaviors such as sidewall bowing and necking. However, it is well-known that the predictable modeling for this plasma etching process needs heavy computations due to the inherent complexities of plasma physics and chemistry. As an effort to address this issue, we have developed ultra-fast 3D feature profile simulation codes using CUDA computing technology. In this work, the 3D feature profile simulation is mainly composed of level set based moving algorithm, ballistic transport module and surface reaction module. Especially, the ballistic transport module requiring the time consumable computations are improved drastically by CUDA based numerical schemes, leading to the real time computation. Finally, we demonstrated real-time 3D feature profile simulation for ultra-high aspect contact hole etching under fluorocarbon plasma. |
| 저자 |
조덕균1, 유동훈2, 육영근1, 장원석3, 천푸름1, 이세아1, 임연호1
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| 소속 |
1전북대, 2경원테크, 3국가핵융합(연) |
| 키워드 |
GPU; feature profile simulation; plasma etch
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| E-Mail |
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| 원문파일 |
초록 보기 |
