검색결과 : 12건
| No. | Article |
|---|---|
| 1 |
Changes in thermal conductivity and bandgap of SiC single crystals in accordance with thermal stress Kim JG, Kim YH, Lee KM, Sohn HC, Choi DJ Thermochimica Acta, 542, 6, 2012 |
| 2 |
Effects of Ag doping on the crystallization properties of Sb-rich GeSb thin films Kim NH, Kim HK, Lee KM, Sohn HC, Roh JS, Choi DJ Thin Solid Films, 519(16), 5323, 2011 |
| 3 |
Physical and electrical characteristics of band-engineered Zr-silicate/SiO2 stacks for tunnel barrier Kang HY, Heo MY, Sohn HC Current Applied Physics, 10(1), E22, 2010 |
| 4 |
The Effects of Postannealing Treatment in Forming Gas on Low-k SiOC(H) Film Park SH, Kim HJ, Cho MH, Ko DH, Sohn HC, Hahn JH, Lee DH, Kwon YS, Park SY, Kim MS Journal of the Electrochemical Society, 157(8), G183, 2010 |
| 5 |
Effect of Bonding Characteristics on the Instability of GexSb1-x Films Park SJ, Jang MH, Park SJ, Cho MH, Kim JK, Ko DH, Sohn HC Journal of the Electrochemical Society, 157(12), II1078, 2010 |
| 6 |
Behavior of strain at a thin Ge pile-up layer formed by dry oxidation of a Si0.7Ge0.3 film Min BG, Yoo JH, Sohn HC, Ko DH, Cho MH, Chung KB, Lee TW Thin Solid Films, 518(8), 2065, 2010 |
| 7 |
Strain behaviors of Si1-xGex grown on oxidized and etched Si1-xGex Min BG, Yoo JH, Sohn HC, Ko DH, Cho MH, Lee TW Electrochemical and Solid State Letters, 11(4), H96, 2008 |
| 8 |
Characteristics of the nanoscale titanium film deposited by plasma enhanced chemical vapor deposition and comparison of the film properties with the film by physical vapor deposition Lee JW, Kim SH, Kwak NJ, Lee YJ, Sohn HC, Kim JW, Sun HJ Journal of Vacuum Science & Technology B, 24(3), 1460, 2006 |
| 9 |
Electrical properties in high-k HfO2 capacitors with an equivalent oxide thickness of 9 angstrom on Ru metal electrode Kim JH, Yoon SG, Yeom SJ, Woo HK, Kil DS, Roh JS, Sohn HC Electrochemical and Solid State Letters, 8(6), F17, 2005 |
| 10 |
High-k nanomixed HfxAlyOz film capacitors grown on Ru metal electrodes by atomic layer deposition Seong NJ, Yoon SG, Yeom SJ, Woo HK, Kil DS, Roh JS, Sohn HC Electrochemical and Solid State Letters, 8(10), F40, 2005 |