| 1 |
Electrical characterization of thermal-annealed very thin barium-doped titanium silicon oxide prepared by liquid-phase deposition
Lee MK, Tung KW, Yu CM, Lee HC
Journal of the Electrochemical Society, 153(10), G911, 2006 |
| 2 |
Deposition of high dielectric barium-doped titanium silicon oxide films on silicon using hexafluorotitanic acid and barium nitrate
Lee MK, Tung KW, Yu CM
Electrochemical and Solid State Letters, 7(11), B42, 2004 |
| 3 |
High-quality nitrogen-doped fluorinated silicon oxide films prepared by temperature-difference-based liquid-phase deposition
Lee MK, Shieh WH, Shih CM, Tung KW
Journal of Physical Chemistry B, 107(46), 12700, 2003 |
| 4 |
High quality fluorinated silicon dioxide films prepared by temperature-difference-based liquid-phase deposition with ammonium hydroxide incorporation
Lee MK, Shieh WH, Shih CM, Lin SY, Tung KW
Journal of the Electrochemical Society, 150(3), F29, 2003 |
| 5 |
Deposition of barium titanate films on silicon by barium fluotitanate powder
Lee MK, Tung KW, Cheng CC, Liao HC, Shih CM
Journal of Physical Chemistry B, 106(19), 4963, 2002 |
