화학공학소재연구정보센터
검색결과 : 11건
No. Article
1 Ultrathin (5 nm) SiGe-On-Insulator with high compressive strain (-2 GPa): From fabrication (Ge enrichment process) to in-depth characterizations
Glowacki E, Le Royer C, Morand Y, Pedini JM, Denneulin T, Cooper D, Barnes JP, Nguyen P, Rouchon D, Hartmann JM, Gourhant O, Baylac E, Campidelli Y, Barge D, Bonnin O, Schwarzenbach W
Solid-State Electronics, 97, 82, 2014
2 Detailed investigation of effective field, hole mobility and scattering mechanisms in GeOI and Ge pMOSFETs
Van Den Daele W, Le Royer C, Augendre E, Mitard J, Ghibaudo G, Cristoloveanu S
Solid-State Electronics, 59(1), 25, 2011
3 Ge1-xSnx stressors for strained-Ge CMOS
Takeuchi S, Shimura Y, Nishimura T, Vincent B, Eneman G, Clarysse T, Demeulemeester J, Vantomme A, Dekoster J, Caymax M, Loo R, Sakai A, Nakatsuka O, Zaima S
Solid-State Electronics, 60(1), 53, 2011
4 Study of Shubnikov-de Haas oscillations and measurement of hole effective mass in compressively strained InXGa1-XSb quantum wells
Nainani A, Irisawa T, Bennett BR, Boos JB, Ancona MG, Saraswat KC
Solid-State Electronics, 62(1), 138, 2011
5 New floating-body effect in partially depleted SOI pMOSFET due to direct-tunneling current in the partial n plus poly gate
Guegan G, Gwoziecki R, Touret P, Raynaud C, Pretet J, Gonnard O, Gouget G, Deleonibus S
Solid-State Electronics, 53(7), 741, 2009
6 Design and optimization of a buried channel PMOS integrable in a Si1-xGexBiCMOS process
Khare P, Schroder D, Sampson K
Solid-State Electronics, 51(6), 828, 2007
7 C-infinity-continuous high-temperature model for low-doped accumulation mode silicon-on-insulator pMOSFETs
Houk Y, Iniguez B, Flandre D, Nazarov A
Solid-State Electronics, 50(7-8), 1261, 2006
8 High performance Si/SiGe pMOSFETs fabricated in a standard CMOS process technology
Collaert N, Verheyen P, De Meyer K, Loo R, Caymax M
Solid-State Electronics, 47(7), 1173, 2003
9 On the origin of the LF noise in Si/Ge MOSFETs
Ghibaudo G, Chroboczek J
Solid-State Electronics, 46(3), 393, 2002
10 The influence of geometric structure on the hot-carrier-effect immunity for deep-sub-micron grooved gate PMOSFET
Ren HX, Hao Y
Solid-State Electronics, 46(5), 665, 2002