| 1 |
Silica nanofilms deposited by atmospheric pressure plasma liquid deposition
McCann MTP, Mooney DA, Dowling DP, MacElroy JMD
Thin Solid Films, 520(7), 2619, 2012 |
| 2 |
Influence of N-2 flow rate on the mechanical properties of SiNx films deposited by microwave electron cyclotron resonance magnetron sputtering
Ding WY, Xu J, Lu WQ, Deng XL, Dong C
Thin Solid Films, 518(8), 2077, 2010 |
| 3 |
Dual comb-type electrodes as a plasma source for very high frequency plasma enhanced chemical vapor deposition
Hwang DS, Lee SY, Lee HM, Kim SJ, Kim GJ
Thin Solid Films, 518(8), 2124, 2010 |
| 4 |
Bias frequency dependence of pn junction charging damage induced by plasma processing
Kamei M, Nakakubo Y, Eriguchi K, Ono K
Thin Solid Films, 518(13), 3469, 2010 |
| 5 |
Study of plasma enhanced chemical vapor deposition of ZnO films by non-thermal plasma jet at atmospheric pressure
Ito Y, Sakai O, Tachibana K
Thin Solid Films, 518(13), 3513, 2010 |
| 6 |
SiO2 film deposition on the inner wall of a narrow polymer tube by a capacitively coupled mu plasma
Yoshiki H, Mitsui T, Sato T, Morinaga T, Marukane S
Thin Solid Films, 518(13), 3526, 2010 |
| 7 |
Visible electroluminescence from silicon nanoclusters embedded in chlorinated silicon nitride thin films
Alonso JC, Pulgarin FA, Monroy BM, Benami A, Bizarro M, Ortiz A
Thin Solid Films, 518(14), 3891, 2010 |
| 8 |
Localized high-rate deposition of zinc oxide films at atmospheric pressure using inductively coupled microplasma
Stauss S, Imanishi Y, Miyazoe H, Terashima K
Thin Solid Films, 518(19), 5391, 2010 |
| 9 |
Low refractive index silicon oxide coatings at room temperature using atmospheric-pressure very high-frequency plasma
Kakiuchi H, Ohmi H, Yamaguchi Y, Nakamura K, Yasutake K
Thin Solid Films, 519(1), 235, 2010 |
| 10 |
XPS characterisation of plasma treated and zinc oxide coated PET
Ben Amor S, Jacquet M, Fioux P, Nardin M
Applied Surface Science, 255(9), 5052, 2009 |
