1 - 3 |
A fundamental understanding of nickel oxide based resistive random access memory with high percentage of oxygen Chowdhury M, Long B, Jha R, Devabhaktuni V |
4 - 7 |
Characterization of P-channel power trench MOSFETs with polycrystalline silicon germanium gate electrode for faster switching Dikshit R, Daggubati M |
8 - 12 |
Effects of applied bias voltage in tunnel junctions with ferroelectric barrier Zhang LB, Tang MH, Li JC, Xiao YG |
13 - 17 |
Energy harvesting from radio frequency propagation using piezoelectric cantilevers Al Ahmad M, Alshareef HN |
18 - 21 |
Simulation of organic inverter Papadopoulos NP, Marsal A, Picos R, Puigdollers J, Hatzopoulos AA |
22 - 26 |
N-doped ZnO based fast response ultraviolet photoconductive detector Shinde SS, Bhosale CH, Rajpure KY |
27 - 31 |
InGaP/InGaAs MOS-PHEMT with a nanoscale liquid phase-oxidized InGaP dielectric Lin HC, Lee FM, Cheng YC, Lee KW, Adriyanto F, Wang YH |
32 - 37 |
A new field dependent mobility model for high frequency channel thermal noise of deep submicron RFCMOS Ong SN, Yeo KS, Chew KWJ, Chan LHK, Loo XS, Boon CC, Do MA |
38 - 47 |
Influence of atomic layer deposition chemistry on high-k dielectrics for charge trapping memories Nikolaou N, Dimitrakis P, Normand P, Ioannou-Sougleridis V, Giannakopoulos K, Mergia K, Kukli K, Niinisto J, Ritala M, Leskela M |
48 - 50 |
Thermal analysis of high power LED packages under the alternating current operation Shin MW, Jang SH |
51 - 55 |
Parasitic capacitance removal of sub-100 nm p-MOSFETs using capacitance-voltage measurements Steinke DR, Piccirillo J, Gausepohl SC, Vivekand S, Rodgers MP, Lee JU |
56 - 62 |
A comparative study for quantum transport calculations of nanosized field-effect transistors Jiang XW, Li SS, Wang LW |
63 - 67 |
Thermal effect on the electroluminescence of InGaN/GaN multiquantum-well light-emitting devices Wu YF, Hsu HP, Liu TY |
68 - 72 |
Compensation of oxygen defects in La-silicate gate dielectrics for improving effective mobility in high-k/metal gate MOSFET using oxygen annealing process Kawanago T, Suzuki T, Lee Y, Kakushima K, Ahmet P, Tsutsui K, Nishiyama A, Sugii N, Natori K, Hattori T, Iwai H |
73 - 79 |
Characterization of single-sided gate-to-drain non-overlapped implantation nMOSFETs for multi-functional non-volatile memory applications Jeng ES, Chen YF, Chang CC, Peng KM, Chou SW, Ho CW, Huang CF, Gong J |
80 - 84 |
Growth of Zn doped Cu(In,Ga)Se-2 thin films by RF sputtering for solar cell applications Li ZQ, Liu QQ, Li JJ, Sun Z, Chen YW, Yang Z, Huang SM |
85 - 89 |
Investigation of TiO2 on AlGaAs prepared by liquid phase deposition and its application Lee KW, Huang JS, Lu YL, Lee FM, Lin HC, Wu TY, Wang YL |
90 - 92 |
Ultraviolet photoresistors based on ZnO thin films grown by P-MBE Liu FJ, Hu ZF, Sun J, Li ZJ, Huang HQ, Zhao JW, Zhang XQ, Wang YS |
93 - 97 |
Explicit model for the gate tunneling current in double-gate MOSFETs Chaves F, Jimenez D, Sune J |
98 - 102 |
Point defect determination by eliminating frequency dispersion in C-V measurement for AlGaN/GaN heterostructure Li L, Yang LA, Zhang JC, Zhang LX, Dang LS, Kuang QW, Hao Y |
103 - 107 |
Phosphorous passivation of the SiO2/4H-SiC interface Sharma YK, Ahyi AC, Issacs-Smith T, Shen X, Pantelides ST, Zhu X, Feldman LC, Rozen J, Williams JR |
108 - 112 |
Photo-controlled molecular growth and electrical performances of a pentacene-based organic transistor with a photo-reactive insulator Bae JH, Jeong C, Lee SD, Yu CJ |